E.i. Dupont De Nemours and Company

Kazushige Ito

Masakatsu Kuroki

Hiroaki Noda

Kazutaka Ozawa

Jean Yang

Tomonori Ohki

A method of manufacturing a thick-film electrode comprising steps of: (a) applying a conductive paste onto a substrate comprising, (i) 100 parts by weight of a conductive powder, wherein the conductive powder is 16 to 49 weight percent based on the weight of the conductive paste; (ii) 0.5 to 10 parts by weight of a metal additive comprising bismuth (Bi); (iii) 1 to 25 parts by weight of a glass frit; and (iv) 50 to 300 parts by weight of an organic medium; and (b) firing the applied conductive paste to form the thick-film electrode, wherein thickness of the thick-film electrode is 0.5 to 15 &#x3bc;m.

Method of manufacturing thick-film electrode

A method of manufacturing a solar electrode comprising steps of:(a) stencil printing a conductive paste onto a front side of a semiconductor substrate through a printing mask comprising: (i) 60 wt % to 95 wt % of a conductive powder, (ii) 0.1 wt % to 10 wt % of glass frit, (iii) 3 wt % to 30 wt % of an organic medium, (iv) 0.4 wt % to 1.7 wt % of an amide compound, based on the total weight of the conductive paste and (b) firing the applied conductive paste to form an electrode.

Method of manufacturing solar cell electrode

A method is disclosed for forming a PDP front electrode by applying a particular type of photopolymerizable black paste, drying the black paste, and applying a particular type of photopolymerizable white paste on top of the dried black paste.

Method for forming front electrode of PDP

Disclosed is a photosensitive paste including glass frit; organic binder; polymerizable monomer; photopolymerization initiator; and organic solvent, wherein at least a part of the polymerizable monomer contains phosphorus atom within the structure.

Photosensitive paste and sintered layer

Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is &#x2212;10&#xb0; C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.

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Kanagawa, Japan

Kazushige Ito