Toppan Printing Co., Ltd.

Ngk Insulators, Inc.

Nippi Corporation

Kazuo Shirakawa

Yukihisa Takeuchi

Tetsuo Watanabe

Azuma Yamamoto

Takao Segawa

Takeo Sugiura

Yoshikatu Sawada

A patterned structure including a plurality of patterned sheet members which have respective configurations and which are partially superposed on each other and which cooperate with each other to define a plurality of voids. At least one of the sheet members includes a thin-walled portion whose thickness is smaller than a thickness of the other portion. The thin-walled portion is formed by etching the appropriate sheet member or members. The thin-walled portion of one sheet member engages the corresponding thin-walled portion or the other portion of the other sheet member or members.

Method of producing a minutely patterned structure

Minutely patterned structure

A water based photosensitive composition comprises a hydrolyzate of a mammal collagen and a photosensitizer serving to cross-link the hydrolyzate when exposed to an active light. The hydrolyzate has a number-average molecular weight, Mn, of 2,000 to 30,000 and an intrinsic viscosity, [.eta.], of 0.060 to 0.155 dl/g in a 0.15 mole citric acid buffer solution maintained at 40.degree.C. Also, the hydrolyzate is capable of maintaining the formability of the collagen fold. A photoresist pattern formed by using the composition exhibits a high resolution, a good dyeing property and a strong corrosion resistance.

Water based photosensitive composition with hydrolyzate of mammal

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Tokyo, Japan

Kazuo Shirakawa