Takara Shuzo Co., Inc.

Dainippon Screen Mfg. Co., Ltd.

Horiba, Ltd.

Kazuo Nakajima

Tsutomu Taniguchi

Takashi Ueno

Masanobu Sato

Akio Hashizume

Akira Obayashi

Hiroaki Sugimoto

Hiroki Tsujikawa

Susumu Matsui

Hirokazu Kotani

Osamu Tanabe

Hiroyuki Ito

Hiroyuki Uchida

Yoshiaki Hirata

Katsuhiko Tomita

Takuma Sasaki

Nobutoshi Ogami

Yoshie Kimizuka

Tomoko Shiomi

Takako T Sato

Katsunori Tanaka

A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.

Substrate cleaning apparatus and substrate cleaning method

Calibration curve data is collected by measuring transmitted light intensities of a treating solvent while solvent temperature is varied. Also measured are a standard transmitted light intensity (transmitted light intensity of a standard treating solution prepared at a predetermined concentration and temperature) and a reference transmitted light intensity (transmitted light intensity of the solvent). Estimated transmitted light intensity of the solvent when its temperature is the same as that of the standard treating solution, is derived from the temperature of the standard treating solution and the calibration curve data stored. A correction factor is computed from a ratio between the reference transmitted light intensity and estimated transmitted light intensity. Then, transmittance of the standard treating solution (standard transmittance) is computed from the standard transmitted light intensity, reference transmitted light intensity and a correction factor. Subsequently, transmitted light intensity of a treating solution for actual use in treating substrates (sample transmitted light intensity) is measured. A sample transmittance of this treating solution is derived from the sample transmitted light intensity, reference transmitted light intensity and a correction factor. Concentration of the treating solution is controlled based on the standard and sample transmittance.

Concentration controlling method and a substate treating apparatus

To provide Nsp7524V restriction-modification genes and a method for producing Nsp7524V restriction enzyme and Nsp7524V modification enzyme by using a novel microorganism having, introduced thereinto, plasmids containing said genes. Nsp7524V restriction-modification genes. A method for producing Nsp7524V restriction enzyme and/or Nsp7524V modification enzyme which comprises incubating a microorganism carrying a plasmid having, integrated thereinto, Nsp7524V restriction-modification genes, and recovering the Nsp7524V restriction enzyme and/or Nsp7524V modification enzyme thus produced from the culture. It becomes possible to efficiently produce Nsp7524V restriction enzyme and/or Nsp7524V modification enzyme which are useful in the field of genetic engineering.

NSP7524V restriction-modification genes

To provide MboI restriction-modification genes and a method for producing MboI restriction enzyme and MboI modification enzyme by using a novel microorganism having, introduced thereinto, plasmids containing said genes. A method for producing MboI restriction enzyme and/or MboI modification enzyme which comprises incubating a microorganism carrying plasmids having, integrated thereinto, MboI restriction-modification genes, and recovering the MboI restriction enzyme and/or MboI modification enzyme thus produced from the culture. It becomes possible to efficiently produce MboI restriction enzyme and/or MboI modification enzyme which are useful in the field of genetic engineering.

MboI restriction-modification genes

A method of removing a lead from a semiconductor tip part is provided by inserting the tip part in a through hole of a substrate. The tip part is equalized in height with substrate by adhering an adhesive tape across the through hole. A gap is left between the tip part and through hole which is filled with an insulative resin. If the substrate already has electrically conductive portions on it, a conductive paste is printed on the substrate between conductive portions and the tip part. If the substrate does not already have them, the conductive portions are formed by the addition of conductive paste on the substrate and which extends to the tip part.

Method of taking out lead of semiconductor tip part

Method for producing bilirubin oxidase by cultivating Schizophyllum commune K-17.

Production of bilirubin oxidase

The invention relates to a high molecular weight .beta.-1,3-glucan composed of repeated glucopyranose units, each unit being represented by the formula: ##STR1## The .beta.-1,3-glucan exhibits anticarcinogenic activity. A process for producing said glucan is also claimed.

Polysaccharides having anticarcinogenic activity and method for

Process for producing cholesterol oxidase by cultivating a strain of the class Basidiomycetes. The oxidase oxidizes cholesterol to form cholest-5-en-3-one and hydrogen peroxide.

Cholesterol oxidase and process for producing same

A polysaccharide having anticarcinogenic activity, and a process for its production from a strain of the genus Isaria of the class Hyphomycetes.

Growing community of inventors

Kyoto, Japan

Kazuo Nakajima