Dainippon Screen Mfg. Co., Ltd.

Dainippon Screen Manufacturing Co., Ltd.

Fujitsu Corporation

Kazuo Kinose

Kazuto Ozaki

Masato Tanaka

Kazuhiro Watanabe

Kenya Morinishi

Masahiro Miyagi

Mitsuaki Yoshitani

Eiichiro Hayashi

Megumu Fukui

Kenichi Nakamura

Toshio Yoshida

Tsuyoshi Okumura

Hideo Okada

Yoshihisa Matsuda

Tetsuo Azuma

Satoru Tanaka

Naoshige Itami

A substrate rinsing apparatus of a non-contact type having a high rinsing ability. An ultrasonic rinsing nozzle and a high-pressure rinsing nozzle are both disposed within the same rinsing apparatus. The ultrasonic rinsing nozzle ejects ultrasonic rinsing liquid as a curtain through a slit, while the high-pressure rinsing nozzle ejects a high-pressure rinsing jet toward the ultrasonic rinsing liquid which is ejected toward a substrate. Not only is foreign matter removed by ultrasonic rinsing, but foregoing matter is removed by the high-pressure rinsing jet and is carried away by a flow of the ultrasonic rinsing liquid and washed off the substrate toward a downstream side of rotation of the substrate.

Apparatus for and method of cleaning substrate

A substrate processing apparatus is provided which requires a reduced installation space and allows for ready change of a process order. A substrate processing apparatus includes: a first transportation mechanism movable along a first transportation path in a predetermined transportation direction; a cassette load portion provided on one side of the transportation path; a plurality of unit portions arranged in a direction crossing the transportation direction on the other side of the first transportation path; and a second transportation mechanism disposed between each two adjacent unit portions and movable along a second transportation path in the transportation direction. The first transportation mechanism can perform a substrate transferring operation with respect to a cassette placed on the cassette load portion and a processing unit in a unit portion disposed in closest proximity to the first transportation path among the plurality of unit portions. The second transportation mechanism can perform a substrate transferring operation with respect to any processing units included in unit portions disposed on opposite sides of the second transportation path.

Substrate processing apparatus

A roll coater for forming a film of uniform thickness on a substrate W includes a bottom plate 6 for transporting the substrate W in a predetermined direction F, a coating rubber roll 4 for transferring a coating liquid Q adhering to the outer circumferential face onto the substrate W, and an ink supplying device for supplying ink to the outer circumferential face of the roll 4. The ink supplying device includes a roll 1 for transferring the coating liquid Q adhering to the outer circumferential face thereof to the outer circumferential surface of a roll 4, metal doctor 2 for supplying a coated film of a coating liquid Q of uniform thickness, and a coating liquid reservoir 3 for storing coating liquid Q. A scraper 7 for scraping the remaining coating liquid Q on the outer circumferential face of the metal roll 1 is provided downstream of the roll 4 and upstream of the coating liquid reservoir 3.

Roll coating device for forming a thin film of uniform thickness

A method of forming a thin film on the surface of a substrate using a roll coater without forming a projection of the thin film near the rear edge of the substrate includes the steps of: loading a substrate on a stage, moving the stage in a predetermined direction up to a certain position where at least a portion of the surface of the substrate comes into contact with the applicator roll while controlling the operation of the roll coating apparatus so that the amount of coating fluid transferred per unit area from the applicator roll to the substrate surface is a predetermined value, and further moving the stage in the predetermined direction to cancel the contact between the surface of the substrate and the applicator roll while controlling the operation of the roll coating apparatus so that the amount of coating fluid transferred per unit area from the applicator roll to the substrate surface is relatively reduced. Until the stage reaches the certain position, a predetermined amount of coating liquid is supplied, and thereafter, a smaller amount of coating liquid is supplied to the surface of the substrate. For example, the transfer speed of the stage is increased while maintaining the rotation speed of the applicator roll at a constant level, or the rotating speed of the applicator roll is decreased while maintaining the transfer speed of the stage at a constant level.

Method of forming a thin film on the surface of a substrate using a roll

An improved roll coating apparatus and method includes a coating roll having a smooth surface for applying a resist, a doctor roll having grooves on its surface for supplying prescribed amount of the resist to the coating roll, and a back up roll which is in contact with the coating roll for conveying a substrate on which the resist is applied to a prescribed direction. Even if there are minute concave portions on the surface of the substrate, the resist is forced to fill the minute concave portions, since the resist is pressed and forced to be applied on the substrate by the coating roll having smooth surface and the back up roll.

Roll coating apparatus and method capable of providing coatings without

A roll coating apparatus for applying a coating liquid having a high viscosity at a normal temperature, to a surface of a substrate, including a device for feeding the substrate, a coating roll rotatably provided in contact with the fed substrate, and a doctor for regulating the coating liquid adhering to the coating roll to a prescribed amount. Respective axial lines of the coating roll and the doctor are inclined with a prescribed angle with respect to the horizontal plane and a coating liquid supply device is provided at the highest position thereof. The coating liquid supplied at the highest end of the coating roll adheres to the surface of the coating roll. The quantity thereof is controlled by the doctor. The coating liquid flows downward on the surface of the coating roll due to its weight and rotation of the coating roll. Accordingly, the coating liquid on the surface of the coating roll is constantly renewed and no irregularities occur to the density of the liquid. The coating liquid is transferred from the coating roll, to form a film having a prescribed uniform thickness on the substrate. This roll coating apparatus may further include a device for heating parts of the apparatus or the substrate to lower the viscosity of the coating liquid. Thus, it becomes possible to form a film of a more uniform and regulated thickness easily.

Roll coating apparatus for forming a film of a high viscosity coating

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Shiga, Japan

Kazuo Kinose