Adeka Argus Chemical Co., Ltd.

Asahi Denka Kogyo K.k.

Kazunori Nishikawa

Tohru Haruna

Masayuki Takahashi

Kenji Tajima

Takashi Takeuchi

Takao Nishina

Mitsuhiro Hamajima

Stabilizers for enhancing the resistance of synthetic resins to deterioration when exposed to elevated temperatures and/or ultraviolet light comprising from about 0.001 to about 10 parts by weight of a bisphenol phosphite having the formula ##STR1## wherein R.sub.1 is tertiary-butyl or tertiary-amyl, R.sub.2 is alkyl having from one to about nine carbon atoms, R.sub.3 is hydrogen or alkyl having from one to about four carbon atoms, and R.sub.4 is alkyl having from one to about thirty carbon atoms; and from about 0.001 to about 10 parts by weight of a phenol having the formula ##STR2## wherein R.sub.5 is alkyl having from one to about four carbon atoms; and R.sub.6 is hydrogen or alkyl having from one to about four carbon atoms; and stabilized synthetic resin compositions comprising such stabilizers.

Synthetic resins and stabilizer compositions for synthetic resin

Stabilizers for enhancing the resistance of synthetic resins to deterioration when exposed to elevated temperatures and/or ultraviolet light comprising from about 0.001 to about 10 parts by weight of a bisphenol phosphite having the formula ##STR1## wherein R.sub.1 is tertiary-butyl or tertiary-amyl, R.sub.2 is alkyl having from one to about nine carbon atoms, R.sub.3 is hydrogen or alkyl having from one to about four carbon atoms, and R.sub.4 is alkyl having from one to about thirty carbon atoms; and from about 0.001 to about 10 parts by weight of a phenol having the formula ##STR2## wherein R.sub.5 is alkyl having from one to about four carbon atoms; and stabilized synthetic resin compositions comprising such stabilizers.

A synthetic resin composition stabilized particularly against the deterioration caused by the action of heat and light, which comprises 100 parts by weight of a synthetic resin, 0.001 to 10 parts by weight of a cyclic phosphite compound represented by the following general formula (I) and 0.001 to 10 parts by weight of a hindered amine compound having a group represented by the following general formula (II) in its molecule: ##STR1## wherein R.sub.1 stands for a tert-butyl or tert-amyl group; R.sub.2 stands for a C.sub.1.about.9 alkyl group; R.sub.3 stands for a hydrogen atom or a C.sub.1.about.4 alkyl group and R.sub.4 stands for a C.sub.1.about.30 alkyl group.

Stabilized synthetic resin composition

A cyclic phosphonite compound having the following formula (I) is disclosed and useful as a stabilizer for a synthetic resin. ##STR1## in which R1 is an alkyl, phenyl or an alkylphenyl, R2 is hydrogen or an alkyl, R3 is an alkyl, R4 is hydrogen or methyl and R1 and R2 may form an alkylene by linking each other.

Phosphonite compound and synthetic resin composition

Synthetic polymer compositions comprise 100 parts by weight of a synthetic polymer and 0.001 to 5 parts by weight of a benzotriazol compound, and thus possesses improved stability.

Stabilized synthetic polymer composition

A synthetic resin composition comprises 100 parts by weight of a synthetic resin, 0.001 to 10 parts by weight of a cyclic alkylphosphite compound of 2,2'-alkylidene-bisphenol (I) and 0.001 to 10 parts by weight of beta-(3,5-dialkyl-4-hydroxyphenyl)-propionic acid ester (II) and is stabilized to light and heat.

Composition of stabilized synthetic resin

Hindered phenol amides are provided having the following formula: ##STR1## wherein: R.sub.1 and R.sub.2 are hydrogen or lower alkyl having from one to four carbon atoms;

Hindered phenol amides

A process for preparing diaryl pentaerythritol diphosphites by reaction of phosphorous trichloride, pentaerythritol and an alkyl phenol having the formula ##STR1## wherein: R.sub.1 is selected from the group consisting of tertiary alkyl having from about four to about eight carbon atoms and cyclohexyl; and

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Matsudo, Japan

Kazunori Nishikawa