Jsr Corporation

Kazunori Kusabiraki

Kiyoshi Tanaka

Takahiro Hayama

Motoyuki Shima

Shinya Minegishi

Yukio Nishimura

Ken Maruyama

Norihiko Sugie

An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1). 

Composition for forming liquid immersion upper layer film, and polymer

A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a single bond or a divalent organic group having 1 to 20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a perfluoroalkyl group having 1 to 5 carbon atoms. Rrepresents a hydrogen atom or a monovalent base-labile group. 

Composition, resist pattern-forming method, compound, method for production of compound, and polymer

A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. Rin the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). Rin the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. Rrepresents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom. 

Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method

A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. Rrepresents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; Rrepresents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof &#x2014;CO&#x2014;, &#x2014;COO&#x2014;, &#x2014;O&#x2014;, &#x2014;NR'&#x2014;, &#x2014;CS&#x2014;, &#x2014;S&#x2014;, &#x2014;SO&#x2014;, &#x2014;SO&#x2014; or a combination thereof; and Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. 

Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound

An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150&#xb0; C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.

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Tokyo, Japan

Kazunori Kusabiraki