Shinko Electric Industries Co., Ltd.

Kazunari Sekigawa

Masatoshi Akagawa

Shinichi Wakabayashi

Hiroaki Samizu

Takahiro Inoue

Michio Horiuchi

Kazutaka Kobayashi

Tsuyoshi Kobayashi

Toshinori Koyama

Yukio Shimizu

Tomomi Sato

Supriya K Patel

Sanjay D Sankolli

An inductor includes a core substrate including minute column-like electrical conductors extending between a front surface and a back surface of the core substrate. Each column-like electrical conductor is insulated from adjacent column-like electrical conductors by being surrounded by an insulating material. Insulation layers are formed on the front surface and the back surface of the core substrate, respectively. At least two connection electrical conductors extend through each of the insulation layers. Each connection electrical conductor is electrically connected to a plurality of the column-like electrical conductors. Wirings are formed on each of the insulation layers to connect said connection electrical conductors to each other electrically. The wirings, the connection electrical conductors and the column-like electrical conductors are connected to form a coil in a three-dimensional manner.

Inductor and manufacturing method thereof

A wiring forming system comprises: maskless exposure unit which directly exposes an unexposed board by using exposure data generated based on design data relating to an wiring board; post-development inspect unit which tests the board after development, by using the exposure data and the image data of the board exposed and developed by the maskless exposure unit; etching unit which etches the developed board; and post-etching inspect unit which tests an etching pattern formed on the etched board, by using etching inspect data generated based on the design data and the image data of the board etched by the etching unit.

Wiring forming system and wiring forming method for forming wiring on wiring board

A component-embedded board fabrication method includes detecting, before the board is covered with a first insulating layer, the actual position of a first electronic component formed on a surface of the board, calculating a displacement between the design position of the first electronic component on the surface of the board and holding the displacement as first displacement data, and correcting, based on the first displacement data, design data to be used for processing the board after the board is covered with the first insulating layer.

Component-embedded board fabrication method

A method of fabricating a component-embedded board including detecting, before the board is covered with an insulating layer, the actual position of an electronic component formed on the surface of the board, calculating a displacement between the design position of the electronic component and the actual position of the electronic component on the surface of the board, and for holding the displacement as displacement data, and correcting, based on the displacement data, design data to be used for processing the board after the board is covered with the insulating layer.

Component-embedded circuit board fabrication method

A drawing apparatus in which drawing data, which is required to perform a drawing operation on drawing blocks on a surface that can be drawn at one time by drawing heads moving relatively to said drawn surface, is sequentially generated based on design data and temporarily stored in a memory and, then, sequentially supplied to drawing engines comprises computing means for computing drawing start instruction data to start the relative movement and the drawing operation of the drawing heads after a delay from the start of production of the drawing data so that at least the drawing data is stored in the memory.

Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations

A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.

Surface light source control apparatus and surface light source control method

A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.

Direct exposure apparatus and direct exposure method

An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.

Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted

A direct exposure system comprises: a data mask that is a data object including drawing data; and a control mask that is a data object including at least one logical layer in which information about exposure conditions applied according to regions on a substrate is specified, and performs a direct exposure process using integrated data generated by combining the data mask with the control mask.

Maskless direct exposure system and user interface

A pattern drawing apparatus for forming patterns, that have a mirror image relationship to each other with respect to a substrate, on both sides of the substrate forms the patterns on both sides of the substrate by drawing the patterns directly on both sides of the substrate in accordance with prescribed data by using a direct drawing means such as a maskless exposure means or an inkjet patterning means.

Pattern drawing apparatus and pattern drawing method for forming patterns, that have mirror image relationship to each other with respect to a substrate, on both sides of the substrate, and test apparatus for use in the pattern drawing apparatus

A drawing apparatus, for forming a desired drawing pattern by drawing the pattern directly on a drawing target surface using a drawing engine equipped with a plurality of drawing devices arranged along a direction of relative movement of the drawing target surface, the drawing engine being designed so that the design spacing of the thus arranged drawing devices is equal to a product of a unit pixel spacing in drawing data and an integer, comprises: correcting means for generating corrected drawing data by correcting the drawing data based on the difference between the design spacing and the actual spacing of the drawing devices; and supplying means for supplying the drawing engine with the corrected drawing data just necessary for direct drawing to a drawing block that the drawing engine can draw at a time on the drawing target surface, each time the drawing target substrate moves in relative fashion by a distance corresponding to an actual pixel spacing that is obtained by dividing the actual spacing of the drawing devices by that integer.

Drawing apparatus and drawing method

In an exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the supplied exposure data, the exposure engine forms an exposure pattern on an exposure target substrate which moves relative to the exposure engine, lights respectively produced from the exposure device groups based on the identical exposure data supplied to each of the plurality of exposure device groups, are projected via optics so as to be superimposed one on top of another on the same area on the exposure target substrate.

Exposure apparatus and exposure method for performing high-speed and efficient direct exposure

An optical exposure method and a device are used for forming patterns on a printed board wiring or semiconductor board. A single exposing region of a surface to be exposed is irradiated with a plurality of optical beams having different irradiating areas and different scanning pitches, such as, a peripheral area is irradiated with an optical beam having a smaller irradiating area and an inner area is irradiated with an optical beam having a larger irradiating area.

Exposure method and device for forming patterns on printed wiring board

A license management system for software which drives a single computer or a plurality of computers includes: an application program for requesting a decision of the number of license which it needs to drive itself and for receiving issuance of the license; a number of license decision unit for determining the necessary number of licenses in accordance with the request from the application program; and a license management unit for issuing the number of licenses which was determined by the number of license decision unit. Further, the number of license decision unit has means for determining the number of licenses based on the following multi-nominal function, LK=f (xx, . . . , xn), where, LK is the number of licenses, and xto xn are parameters which are needed to determine the number of licenses. According to the present invention, it is possible to provide a license management system enabling issuance of a license in which the sales strategy of a software maker was considered.

License management system

The present invention provides a method of data processing for calculating and storing in a memory to deform a data structure of layout designing data in which cells having geometry information and also having reference information to refer to geometry information of another cell are hierarchically combined with each other.

Method for designing a layout of a large scale integrated (LSI) circuit and a recording medium incorporating therein a program for such data processing

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Nagano, Japan

Kazunari Sekigawa