Sanyo Chemical Industries, Ltd.

Mitsubishi Electric Corporation

Kazumitsu Suzuki

Makoto Miyamoto

Satoshi Ueyama

Masahiro Matsuoka

Shohei Sato

Shunichiro Yamaguchi

Ayayo Sugiyama

Provided is a cleaning agent for electronic materials, which enables very efficient advanced cleaning such that yield in the production of the electronic materials is improved and cleaning in a short period of time becomes possible, the cleaning agent having excellent cleaning power for fine-grained particles and organic matter and being able to reduce metallic contamination on the substrate. The cleaning agent for electronic materials comprises sulfamic acid (A), an anionic surfactant having at least one sulfonic acid group or a salt thereof in the molecule (B), a chelating agent (C), and water, wherein the pH at 25 C is preferably not more than 3.0 and the (B) is preferably a polymeric anionic surfactant (B1) having a weight average molecular weight of 1,000 to 2,000,000.

Cleaning agent for electronic materials

A method for cleaning articles using a surfactant which is effective in the formation of stable microbubbles is provided. The surfactant for microbubble formation contains a (poly)oxyalkylene adduct (A) of an active hydrogen atom-containing compound (a) represented by formula (1)Z-[(AO)&#x2014;H]&#x2003;&#x2003;(1) wherein Z is the residue of an active hydrogen-containing compound (a) with a valence of P resulting from removal of the active hydrogen atom or atoms; A is an alkylene group containing 1 to 8 carbon atoms; n is an integer of 1 to 400; and p is an integer of 1 to 100. The foaming power of a 0.02% by weight aqueous solution of the (poly)oxyalkylene adduct (A) as measured at 20&#xb0; C. by the Ross Miles test is not higher than 50 mm.

Method for cleaning, employing a surfactant for fine-bubble formation

To provide a surfactant which is obtainable by using substantially no alkali metal, has excellent readhesion prevention ability of finely-pulverized particles at the time of cleaning, and is capable of quite efficient and advanced cleaning. In the present invention, a surfactant which comprises a neutralized salt (AB1) and/or neutralized salt (AB2) is used. Neutralized salt (AB1): a neutralized salt (AB1) which comprises an acidic compound (A1) containing at least each one of an acid group (X1) of an acid having the difference of heat of formation in an acid dissociation reaction (Q1) of 3 to 200 kcal/mol and a hydrophobic group (Y) containing 1 to 36 carbon atoms, and a nitrogen-containing basic compound (B) having the difference of heat of formation in a proton addition reaction of 10 to 152 kcal/mol, wherein (X1) is at least one species selected from a sulfonic acid group, and the like. Neutralized salt (AB2): a neutralized salt (AB2) which comprises a polymer (A2) having at least one acid group (X2) within the molecule, and the nitrogen-containing basic compound (B) having the difference of heat of formation in a proton addition reaction of 10 to 152 kcal/mol.

Surfactant

Growing community of inventors

Kyoto, Japan

Kazumitsu Suzuki