Nec Corporation

Kao Corporation

Shiseido Company, Limited

Figla Company, Ltd.

Kazumi Saito

Toshiyuki Suzuki

Kazuya Otsuji

Yoshinori Takema

Kikuhiko Okamoto

Satoshi Takano

Hakaru Inaoka

Yasuki Honda

Yukio Sugimura

Noriko Okamura

Fukuji Suzuki

Tsutomu Saito

Nobuhisa Tsujita

Yoshimi Kanada

Toshiaki Ougiya

In a semiconductor device manufacturing method, a gate insulating film is formed on a silicon substrate, a conductive film made of a conductive material is formed on a insulating film, an anti-reflecting coating made of an organic material is formed on the conductive film, a photosensitive resist film is formed on the anti-reflecting coating, a predetermined optical image on the resist film is developed by exposure to form a resist pattern, the anti-reflecting coating is then selectively removed by dry etching using a plasma of a gas mixture containing oxygen gas, a reactive gas, and an inert gas, while using the resist pattern as a mask, thereby forming a pattern, and the conductive film is etched by using the resist pattern as a mask, thereby forming an electrode.

Semiconductor device manufacturing method

The invention provide a method for manufacturing a wire by etching a metallic film involving a high melting point metal without side etching. When a tungsten film 4c is etched by a mixed gas involving SF.sub.6 and N.sub.2, tungsten nitride films 14 are formed on side walls of an tungsten film 4c being etched, and said tungsten nitride films 14 serve as protector against etching. The selected figure is FIG. 5.

Method for etching a tungsten film

The present invention provides fundamental materials excellent in general purpose used for buildings, etc. as windows and interior and exterior walls of general buildings, houses, cars, etc., concretely, various laminates with the flip-flop effect (the effect of delicately changing in color, depending on the angles of view) and a decorative effect due to a colored mirror face, which are composed at least of a light-transmitting or light-intercepting base and a brightening pigment prepared by covering mica grains on the surfaces with titanium oxides including low-valent titanium oxides.

Laminates

A novel acidic heteropolysaccharide which comprises as its structural units arabinose, mannose, galactose, glucuronic acid, and xylose, at a specific ratio. The polysaccharide can be prepared by culturing a callus induced from a plant belonging to the genus Polianthes L. in a culture medium containing plant hormones. The polysaccharide can be used as a component of agents for external application and detergents, and provides good moisturizing effects and a smooth, satisfying feeling upon use. When formulated in detergents, they produce remarkable improvement in a clean, rich feeling upon use.

Detergent composition containing polianthes L-derived acidic

Polysaccharide and process for preparing the same

Growing community of inventors

Tokyo, Japan

Kazumi Saito