Toray Industries, Inc.

Stamicarbon B.v.

Kazumasa Chiba

Kazuhiko Kobayashi

Toshio Muraki

Masatoshi Iwamoto

Keiichi Egawa

Kazuhisa Yano

Nobuo Kato

Tosaku Susuki

Osamu Ueno

Kiyoji Tanaka

Takuya Ogawa

Disclosed is a resin composition comprising (A) from 1-98 wt. parts of a graft copolymer obtained by graft-polymerizing (a) 5-80 wt. % of a rubbery polymer and (b) 95-20 wt. % of a monomer mixture consisting of 40-90 wt. % of an aromatic vinyl compound, 60-10 wt. % of a vinyl cyanide compound and 0-50 wt. % of another ethylenically unsaturated compound copolymerizable therewith, (B) 1-40 wt. % parts of a modified copolymer selected from (B.sub.1) a modified vinyl copolymer obtained by polymerizing (a) 40-90 wt. % of an aromatic vinyl compound, (b) 60-10 wt. % of a vinyl cyanide compound, (c) 0.01-10 wt. % of a monomer having an epoxy, carboxyl or amino group, and (d) 0-40 wt. % of another ethylenically unsaturated compound, and (B.sub.2) a modified olefinic copolymer obtaind by copolymerizing (e) 50-95 wt. % of ethylene or propylene, (f) 0.1-20 wt. % of a monomer having an epoxy, carboxyl or amino group, and (g) 0-40 wt. % of another ethylenically unsaturated compound, (C) 1-60 wt. parts of an imidized acrylic resin, and (D) from 0-90 wt. parts of a vinyl copolymer obtained by polymerizing (a) 40-90 wt. % of an aromatic vinyl compound, (b) 60-10 wt. % of a vinyl cyanide compound and (c) 0-40 wt. % of another ethylenically unsaturated compound, wherein the content of the rubbery polymer (a) in the graft copolymer (A) is 5 to 40 wt. % based on the resin composition. This resin composition gives a shaped article having a delustered and pleasing appearance and a good impact resistance.

Delustered thermoplastic resin composition with good impact resistance

Resin compositions of (A) 50-95 percent by weight of a polyamide and (B) 5-50 percent by weight of a modified polyolefin containing in side chains 0.005-5 molar percent of functional groups expressed by formulas (I) and/or (II) below and 0.005-5 molar percent of functional groups expressed by formulas (III) and/or (IV) below provide molds having a high impact resistance and are applicable to automobile parts. ##STR1## Where R.sub.1 represents hydrogen or methl and wherein R.sub.2, R.sub.3 and R.sub.4 represent hydrogen, aliphatic, alicyclic or aromatic residual groups having 1-30 carbon atoms.

Resin compositions and their manufacturing method

Polyamide resin composition

Polyamide resin compositions

A resinous composition, having excellent toughness, flexibility, heat resistance and moldability, comprises (A) from 5 to 98% by weight of a polyamide and (B) from 95 to 2% by weight of a polyolefin modified with from 0.001 to 10% by mole based on all polymer components of a component having at least one functional group selected from the groups represented by the following general formulas (I), (II) and (III); ##STR1## wherein R.sub.1 denotes an organic group and R.sub.2, R.sub.3, R.sub.4 and R.sub.5 denote a group selected from the groups consisting of hydrogen atom and organic group respectively.

Resinous composition

A block copolyamide having effectively improved impact strength is obtained by polymerizing a mixture comprising substantially from about 50 to about 95 parts by weight of lactam and from about 50 to about 5 parts by weight of polyol in the presence of catalyst for an anionic polymerization and activator represented by the following formula (I); ##STR1## wherein A denotes a bifunctional organic residue having at least one kind of heteroatoms selected from the group consisting of N, O, S, F, Cl, Br and I, and Y and Y' denote an acyl group selected from the group consisting of ##STR2## respectively, and n and n' denote an integer of 3 to 11 respectively, or by polymerizing, in the presence of catalyst for anionic polymerization, a mixture comprising substantially from about 50 to about 95 parts by weight of lactam and from about 5 to about 50 parts by weight of prepolymer obtained by a reaction of polyol and activator represented by the above formula (I), wherein A denotes a bifunctional aromatic residue having at least one halogen atom attached to the aromatic ring, and Y, Y', n and n' denote the same.

Process for producing lactam/polyol block copolymer

A copolyamide comprised of undecamethylenehexahydroterephthalamide units and hexamethylenehexahydroterephthalamide units having a trans isomer ratio of hexahydroterephthalic acid residues of 57 to 83 percent is provided. The copolyamide is suitable for injection and extrusion molding. The copolyamide is prepared by a process comprising heating an equimolar salt of undecamethylenediamine and hexahydroterephthalic acid and an equimolar salt of hexamethylenediamine and hexahydroterephthalic acid at a maximum temperature of about 280 to 360.degree. C. to stably melt-polymerize the copolyamide. A copolyamide molding composition comprised of the copolyamide and an inorganic reinforcing agent can be formed into various molded articles having excellent properties.

Copolyamide from 1,4-cyclohexane dicarboxylic acid and diamine mixture

The aliphatic copolyesteramide having high degree of polymerization, is prepared by heating a mixture of (A) ester-forming components comprising (a) aliphatic diols and (b) aliphatic dicarboxylic acids and (B) amide-forming components comprising at least one component selected from the group consisting of (a) aliphatic .omega.-aminocarboxylic acids and (b) equimolar salt of (.alpha.) aliphatic diamines and (.beta.) aliphatic dicarboxylic acids, at temperatures of about 150.degree. to 260.degree. C., substantially under an atmospheric pressure, in the presence of catalyst and in the substantially absence of water, and subsequently heating the resulting esterified product at temperatures of about 200.degree. to 300.degree. C. under a reduced pressure. The obtained copolyesteramide can be formed into various molded articles, such as tubing, having excellent flexibility, toughness, shapability, chemical resistance, heat resistance, hydrolysis resistance and fatigue resistance.

Process for producing aliphatic copolyesteramide, an aliphatic

A photosensitive resin composition comprising a polyamide containing 10 to 70% by weight of a polyoxyethylene segment or poly(oxyethylene/oxypropylene) copolymer segment having a number average molecular weight of from 150 to 1,500 in its molecular chain, and a photopolymerizable unsaturated compound. This composition exhibits excellent flexibility and water- and alcohol-developability, and results in a printing plate exhibiting excellent transparency, toughness and printing durability.

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Nagoya, Japan

Kazumasa Chiba