Kobe Steel, Ltd.

Kabushiki Kaisha Kobe Seiko Sho

Kazuki Takahara

Kenji Yamamoto

Hirofumi Fujii

Koji Hanaguri

Toshiki Satou

Yasuomi Morikawa

Susumu Kujime

A hard laminated Mm wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 5 nm or more, and the thickness of layer A per layer is 200 nm or less.

Hard laminated film, method of manufacturing the same and film-forming device

A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less. Layer A has a cubic rock-salt crystal structure such as that of Ti, Cr, Al, V nitride, carbonitride or carbide, and layer B is a hard film having a crystal structure other than cubic such as that of BN, BCN, SiN, SiC, SiCN, B&#x2014;C, Cu, CuN, CuCN or metallic Cu. Alternatively, layer A has a chemical composition satisfying the following formula (1), and layer B has a chemical composition satisfying the following formula (2). Layer A: Cr(BCNO)0&#x2266;a&#x2266;0.15, 0&#x2266;b&#x2266;0.3, 0&#x2266;c&#x2266;0.1, 0.2&#x2266;e&#x2266;1.1&#x2003;&#x2003;(1) Layer B: BCN0&#x2266;s 0.25, (1-s-t)/t&#x2266;1.5&#x2003;&#x2003;(2) Alternatively, Layer A has a specific atomic ratio composition of (TiAlM)(BCNO) and Layer B has one or more specific atomic ratio compositions selected from among the compositions BCN, SiCN, CN, Cu(CN). Alternatively, Layer A has one of the following Compositional Formulae 1 or 2. Formula 1: (TiAlM), (BCNO), Formula 2: (Cr&#x3b1;X&#x3b1;)(BCNO)(X is one or more metal elements selected from among Ti, Zr, Hf, V, Nb, Ta, Mo, W, Al, Si. Layer B has the following compositional formula 3. Formula 3: M(BCNO). M is one or more metal elements selected from among W, Mo, V, Nb.

A hard film for cutting tools which is composed of(Ti, Al, Cr, Si, B)(CN)

Hard film cutting tools, cutting tool coated with hard film, process for forming hard film and target used to form hard film

A hard film for cutting tools which is composed of

Hard film for cutting tools, cutting tool coated with hard film, process for forming hard film, and target used to form hard film

To provide an evaporation source and an arc evaporation apparatus in which an evaporation material as a cathode of arc discharge, and a magnetic field generating source arranged so that all lines of magnetic force crossing the evaporation surface of the evaporation material cross substantially vertically are arranged whereby the number of molten particles arriving at a substrate by the magnetic field can be reduced, and deviation of occurrence of arc spots can be suppressed.

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Takasago, Japan

Kazuki Takahara