Canon Kabushiki Kaisha

Kazuki Nakagawa

Yosuke Murakami

Takahiro Matsumoto

Noriyasu Hasegawa

Keiji Emoto

Shigeru Terashima

Hisanobu Azuma

Tatsuya Hayashi

Masami Yonekawa

Kiyohito Yamamoto

Kazuhiro Sato

Mitsuru Hiura

Masahiro Tamura

Tsutomu Terao

Yoichi Matsuoka

Tomofumi Nishikawara

Toshihiro Maeda

In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.

Imprint device, imprint method, storage medium, and article manufacturing method

An imprint apparatus performs an imprint process including aligning a substrate and a mold in a state in which the mold is in contact with an imprint material on the substrate and curing the imprint material by light irradiation after the aligning. The apparatus includes a first irradiation unit configured to perform first light irradiation of the imprint material on the substrate before bringing the mold into contact with the imprint material on the substrate for the aligning, a second irradiation unit configured to perform second light irradiation of the imprint material on the substrate in the aligning, and a third irradiation unit configured to perform third light irradiation of the imprint material on the substrate in the curing, wherein an exposure amount by the first light irradiation is determined based on an exposure amount by the second light irradiation.

Imprint apparatus, imprint method, and article manufacturing method

There is provided that an imprint apparatus that forms a pattern on a substrate by curing an imprint material in a state in which a mold and the imprint material on the substrate are in contact with each other, the apparatus including a control unit configured to control a movement of a stage configured to hold the substrate and the supplying of a gas by a gas supplying unit, wherein the control unit removes charges from the mold by starting the supplying of the gas by the gas supplying unit before starting to move the stage below a dispenser after the mold and the cured imprint material are separated, and making a peripheral member face the mold via the gas during the movement of the stage.

Imprint apparatus, imprint method, and method of manufacturing article

An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.

Imprint apparatus, method of operating the same, and method of manufacturing article

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.

Imprint apparatus, imprint method, and method for manufacturing article

The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.

Imprint apparatus, and method of manufacturing article

The present invention provides an imprint method of molding an imprint material supplied on a shot region of a substrate by a mold having a pattern region in which a pattern has been formed, the method comprising a deformation step of performing, based on information indicating at least one among a shape of the pattern region and a shape of the shot region, deformation of at least one region among the pattern region and the shot region, an estimation step of estimating a moving amount of a mark by the deformation, the mark being provided in the at least one region, and an overlay step of performing, based on the moving amount and detection results of positions of a mark in the pattern region and a mark in the shot region, overlay between the pattern region and the shot region.

Imprint method, imprint apparatus, and method of manufacturing article

The present invention provides an imprint method of forming a pattern on a shot region formed on a substrate by using a mold having a pattern region, the method comprising performing control for deformation of at least one of the pattern region and the shot region in accordance with a deformation amount, obtaining a shift amount between each of a plurality of marks provided on the pattern region and a corresponding one of a plurality of marks provided, on the shot region after the deformation, selecting marks to be used for controlling an overlay between the pattern region and the shot region so as to satisfy a preset condition based on the shift amounts, and performing feedback control for the overlay based on detection results on positions of the selected marks, after the deformation in the performing control for deformation.

Provided is an imprint apparatus that includes a supplying device configured to supply an imprint material to an imprint region on a substrate; a driving device configured to perform driving for bringing a mold into contact with the imprint material supplied to the imprint region; and a sealing device configured to seal the imprint region by forming a flow of gas, wherein the supplying device includes a member having a surface facing the substrate, an inlet port through which the gas flows into the member and an outlet port through which the gas flows out of the member are formed in the surface, and a flow path for connecting the inlet port with the outlet port is formed in the member.

Imprint apparatus, and article manufacturing method

An imprint apparatus is provided with: an application unit; a substrate holding unit including an auxiliary plate; a gas supply unit including multiple supply outlets, which supplies gas to an interstice between a mold and a substrate, in conjunction with movement of a shot region by driving of the substrate holding unit from an application position of the application unit to a pressing position where pressing is conducted, when pressing the mold against an uncured resin applied to the shot region; and a controller which selects a supply outlet to supply the gas so that the supply outlet that supplies the gas among the multiple supply outlets is opposed by either the substrate or the auxiliary plate, while the shot region to which the uncured resin was applied is moved toward the pressing position, and which controls a direction of movement of the shot region.

Imprint apparatus and imprint method, and article manufacturing method

The present invention provides an imprint apparatus which performs an imprint process of molding an imprint material on a substrate with a mold and forming a pattern on the substrate, the apparatus including a detector configured to detect a shearing force generated in at least one of the mold and the substrate in a case where a pattern of the mold and a region of the substrate are aligned with each other with the imprint material on the substrate and the mold being in contact with each other, and a controller configured to control the imprint process based on the detected shearing force.

Imprint apparatus

An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.

Imprint method, imprint apparatus, and article manufacturing method

The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performing imprint processing for a target shot region as a shot region to undergo imprint processing based on heating control information used to heat, by the heating unit, a shot region which has undergone imprint processing prior to the target shot region, the control unit controls heating of the substrate by the heating unit so that a shape of the target shot region which has been deformed by heating of the substrate according to the control information becomes close to a target shape.

An imprint method of forming a pattern of a resin on a substrate held on a holding surface. An uncured resin on the substrate is brought in contact with a mold. A partial region of the substrate is thermally deformed by irradiating the region with light so as to change an outer circumferential shape of the region. The uncured resin is cured on the region by irradiating light having a wavelength different from the deforming light. The mold is released from the cured resin on the region in contact with the mold. In at least a portion of a period during the deforming step, a region different from the region is held at a first suction force, while the region is held at a second suction force less than the first. The first suction force and the second suction force act between the substrate and the holding surface.

An imprint method of transferring a pattern formed on a mold onto a resin on a substrate. The substrate is held on a holding surface by suction. A shape of a substrate-side pattern area pre-existing on the substrate is deformed. A resin on the pattern area is brought in contact with the mold. Positions of the pattern of the mold and of the pattern area are adjusted. The resin is cured and the mold is released from the resin in contact with the mold. A deformation force, which is greater than a maximum static frictional force acting between a rear surface of the substrate corresponding to the pattern area and the holding surface, is applied to the substrate. A suction force acting on the rear surface of the substrate corresponding to the pattern area in deforming is less than a suction force acting on the substrate in adjusting.

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Utsunomiya, Japan

Kazuki Nakagawa