Canon Kabushiki Kaisha

Kazuki Fujimoto

Jun Tamai

Ichiro Okumura

Hajime Kanazawa

Yutaka Watanabe

Jun Ito

Takayuki Tsukimoto

Ryuji Suzuki

Tetsuya Nishio

Takeshi Miyachi

Kazuyuki Omori

An exposure apparatus for exposing a substrate to light via a reticle includes a first plurality of optical elements configured to direct the light; a first vacuum chamber configured to accommodate said first plurality of optical elements; a first support configured to support said first vacuum chamber; and a second support configured to support at least one of said first plurality of optical elements substantially independently of said first support.

Exposure apparatus and device manufacturing method

At least one exemplary embodiment is directed to a light source which includes a plasma generator configured to generate plasma, a mirror configured to reflect light that is produced by the plasma, a plurality of plates provided between the plasma and the mirror and arranged radially around an axis passing through a light emission center, and a magnetic-field generator for generating a magnetic line of force between the plasma and the mirror so that trajectories of charged particles scattering from the plasma are curved toward the plates.

Light source

A light source apparatus for generating a plasma and supplying a light irradiated from the plasma to an optical system, said light source apparatus includes a chamber for accommodating a region that generates the plasma, wherein a density of a hydrocarbon compound included in a gas in the chamber is 300 ppb or less.

Light source apparatus, exposure apparatus and device fabrication method

A light source unit including a condensing mirror for collecting EUV light emitted from a light emission point, a debris reducing member for reducing debris, produced from the light emission point or from a portion around the light emission point, and to be deposited on the condensing mirror, and a base member arranged so that the condensing mirror and the debris reducing member are mounted thereon.

Light source unit, exposure apparatus, and device manufacturing method

A gas flow measurement apparatus measures flow of gas emitted from an EUV light source in a light source chamber that accommodates the EUV light source, and includes an absorber that receives light emitted from the EUV light source and introduced into the gas flow measurement apparatus.

Gas flow measurement apparatus and method for EVU light source

A vibration actuator has a vibration member for generating a vibration, and a contact member which contacts the vibration member and moves relative thereto when the vibration member vibrates. A portion of the vibration member, which is in sliding-contact with the contact member, is formed as a separate first member which is coupled to rest of the vibration member.

Vibration actuator

A vibration wave driving device comprises a vibration member in which a vibration is generated, and a contact member contactable with the vibration member and movable relative to the vibration member by the vibration generated in the vibration member, wherein a material having resin as a chief component is used for one of a first contact portion of the vibration member, which contacts the contact member, and a second contact portion of the contact member, which contacts the vibration member, and wherein a ceramic of carbide origin is used for the other one of the first contact portion and the second contact portion.

Vibration wave driving device and apparatus having the same

A vibration wave driving apparatus relatively moves a contact member and a vibration member by a vibration generated in the vibration member. The vibration member has a plurality of projections for magnifying the vibration displacement. At least the projections are formed on the vibration member by a press work.

Vibration wave driving apparatus and a vibration member, and

A vibration wave actuator having a vibrating member for generating a vibration wave therein and a contact member contacting the vibrating member so as to be movable relative to the vibrating member by a friction force caused by the vibration wave, as well as to a system using the actuator. Contact portions of the vibrating member and the contact member are made of iron or iron alloy.

Vibration wave actuator and system using the same

A vibration wave driven motor including a stator, a rotor, and an urging member for causing the stator and the rotor to contact each other under pressure. The urging member is supported by a supporting member at a predetermined position. The supporting member is shiftable in the urging direction of the urging member.

Vibration wave driven motor

In a vibration driven motor, a support member for supporting one end of a pressing member which presses a vibration member and a moving member receiving a drive force from the vibration member is fixed to a fixing member, with a result that the vibration member is indirectly supported.

Growing community of inventors

Utsunomiya, Japan

Kazuki Fujimoto