Noritsu Koki Co., Ltd.

Kazuhiro Yoshida

Ryuichi Iwasaki

Hirofumi Mankawa

Mikiya Seto

Yozo Ohki

A plasma generation apparatus is provided which includes: an apparatus main body which has a microwave generation section which generates a microwave and a plasma generation nozzle which generates and emits a plasma gas based on the energy of the microwave; a microwave detection unit which detects a microwave leaking from the apparatus main body; and a control section which stops the microwave generation section from generating a microwave if the detection unit detects a microwave.

Plasma generation apparatus and work processing apparatus

A photo-printing system includes a laser exposure unit, a reference clock generation unit, an image input unit, and a controller. The image input unit receives first pixel data and second pixel data to be expressed after the first pixel in accordance with image data. In a first control, the first and second pixels are scanned for exposure in a laser emission region state wherein each of the scan-start timings of the first and second pixels are controlled in accordance with a reference clock. In a second control, the first pixel is scanned for exposure in a nonlinear light emission region state, and the second pixel having a density equal to or lower than a predetermined density is scanned for exposure in the laser emission region state, the scan-start timing of the second pixel is advanced with respect to the first control.

Image forming apparatus

An image exposure apparatus of a different angle incident type is provided having a single optical sensor unit for determining the timing for start point synchronization along the main scanning direction, an output level detecting device determining the output level of each beam of light which can be detected by the optical sensor unit, a first modulating device modulating the output level of each beam of light with a pixel data in the light path for exposure, and a second modulating device modulating the output level of each beam of light to a higher level outside of the light path for exposure than the level determined by said output level detecting device.

Growing community of inventors

Wakayama, Japan

Kazuhiro Yoshida