Ckd Corporation

Octec, Inc.

Tokyo Electron Limited

Kazuhiro Sugata

Katsuya Okumura

Shigenobu Itoh

Kazuhiro Arakawa

Hiroshi Tomita

Hiroyuki Murase

Shinji Ikenoya

Hiroshi Kagohashi

Naofumi Murata

Hiroto Yasue

Tetsuya Toyoda

Shoichi Kitagawa

Yasushi Hirako

Takashi Kato

A flow rate control device comprises a regulator that adjusts the pressure of a fluid to be supplied, a plurality of narrowed pathways arranged in parallel on the downstream side of the regulator, and an open/close section that switches a predetermined narrowed pathway amongst the plurality of narrowed pathways between an open position and a closed position. One of the pathways can be an open narrowed pathway arranged on the downstream side of the regulator and another can be an opened/closed narrowed pathway arranged downstream of the regulator in parallel with the open narrowed pathway. In this case, the open/close section that switches the opened/closed narrowed pathway between as open position and a closed position.

Flow rate control device

In an assembling structure of an actuator part of a chemical liquid valve, a cover is formed with a protrusion extending in a radial direction of a valve element, and a cylinder is formed with an engagement part engageable with the protrusion. A cover is placed to hold a spring in a compressed state in the cylinder and make a cap part cover an opening of the cylinder. The protrusion and the engagement part are engaged with each other to integrally connect the cylinder and the cover without separating from each other.

Assembling structure of actuator part of fluid control valve, and fluid control valve formed with the structure

A chemical liquid supply system that prevents the generation of heat during operation in a pump and allows downsizing the discharge pump for instilling a chemical liquid from a tip nozzle. Compressed air is supplied to an upper space of a resist bottle and the chemical liquid is conferred positive pressure and sent out to a pump chamber of a discharge pump, thereby the pump chamber is filled with a resist liquid. This eliminates the need of a conventional construction where a spring or others are used to drive a flexible membrane of the discharge pump to the operation chamber side to take in the resist liquid. As a result, no electric motor is used, so there is obviously no risk of heat damage to a semiconductor wafer and the discharge pump itself can be further downsized.

Chemical liquid supply system

An openingof a supply/withdrawal passageis positioned at the center part of the internal wall surfaceof the operating chamber(concave area), and a pinthat protrudes toward the diaphragmis provided in a position that is offset from the center of the wall surface. When the diaphragmis deformed toward the operating chamberby the suction of an operation air into the operating chamberduring drawing in the chemical liquid, a part of the diaphragmopposing to the pinrides on the pinand this part becomes a slightly convex shape toward the pump chamber. When the operation air is supplied from the openinginto the operating chamberduring the discharge of the chemical liquid, the deformation begins first from the part of the diaphragmriding on the pin

Pump for supplying chemical liquids

A seal structure in which a sealing memberfitted in the seal holding partis elastically deformed to hermetically seal a flow passage joining portion. The seal holding partopening on a flow passage side and including a first retaining surface, a second retaining surface, and a circumferential surface. The sealing memberincludes a first surfacein contact with the first retaining surface, a second surfacein contact with the retaining surface, and an inner surfacelocated inside the seal holding partand tapered to have a diameter becoming smaller from the first surfaceside to the second surfaceside. An engagement portionengaged in the seal holding partis formed protruding from an outer surfacelocated on the circumferential surfaceside and on the first surfaceside. When the sealing memberis fitted in the seal holding partwhile the engagement portionis pressed, the sealing memberis placed such that the inner surfaceon the first surfaceside protrudes inward and the outer surfaceis in contact with the circumferential surface

Seal structure, fluid device, integrated valve, and sealing member

There is disclosed a flow control valve which regulates a flow rate by determining a stop position of a piston by contact in an opened state, and which enables remote and high-precision flow rate regulation. In a closed state, an urging force of a return spring acts on a piston, bringing a diaphragm into close contact with a valve seat. In this state, when compressed air is supplied into a pilot chamber, moving the piston, the diaphragm is brought out of contact with the valve seat. Then, the piston comes into contact with a nut and the diaphragm is stopped providing a fixed clearance between the diaphragm and the valve seat. An opened state is established. Of course, the nut can be moved to any desired position by means of a serve motor or the like, so that a position at which the piston comes into contact with the nut can be changed.

Growing community of inventors

Komaki, Japan

Kazuhiro Sugata