Tokyo Electron Limited

Kazuhiro Shiba

Michael Carcasi

Masashi Enomoto

Masahide Tadokoro

Toyohisa Tsuruda

Various embodiments of systems and methods for monitoring thermal characteristics of substrates, substrate processes and/or substrate processing module components are disclosed herein. More specifically, the present disclosure provides various embodiments of a thermal imaging sensor within various substrate processing modules (e.g., a liquid dispense module, a baking module or combined bake module, an interface block, a wafer inspection system (WIS) module, a plating dispense module or another processing module) of a substrate processing system. By positioning the thermal imaging sensor at various locations within the substrate processing system, the present disclosure enables thermal data to be remotely collected from the substrate surface, a liquid dispensed onto the substrate surface, a processing space surrounding the substrate, or a component included within a substrate processing module (e.g., a liquid dispense nozzle, a spin chuck, a spin coat cup, a cooling arm, a WIS component, a heating component, etc.).

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Koshi, Japan

Kazuhiro Shiba