Tokyo Electron Limited

Kazuhiro Ooya

Shigeru Kasai

Masatake Yoneda

Naoki Shindo

Hiroyuki Miyashita

Tomohiro Suzuki

Ikuo Sawada

Ayuta Suzuki

Disclosed is a liquid processing apparatus that processes a substrate with a processing liquid. The processing apparatus includes: a substrate holder configured to hold the substrate; a processing liquid supply unit configured to supply the processing liquid to the substrate held by the substrate holder; a rinsing liquid supply unit configured to supply a rinsing liquid to the substrate; and a light emitting element configured to emit light of a wavelength range, which is absorbed only by the substrate, and irradiate the emitted light to the substrate.

Liquid processing apparatus, liquid processing method, and recording medium having program for executing liquid processing method recorded therein

An annealing apparatus includes heating sources provided to face a wafer W, the heating sources having LEDs emitting lights to the wafer; light-transmitting members for transmitting the lights emitted from the LEDs; and cooling members made of aluminum and provided to directly contact with the heating sources, respectively. The heating sources include a plurality of LED arrays having supporters made of AlN, each having one surface on which the LEDs are adhered by using a silver paste; and other surface on which thermal diffusion members made of copper are adhered by using a solder. The LED arrays are fixed to the cooling member by using screws via a silicone grease.

Annealing apparatus

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Nirasaki, Japan

Kazuhiro Ooya