Screen Semiconductor Solutions Co., Ltd.

Dainippon Screen Mfg. Co., Ltd.

Kazuhiro Nishimura

Akihiko Morita

Yasuo Kawamatsu

Yasushi Nakamura

Ryuichi Chikamori

Masami Ohtani

Yukihiko Inagaki

Tetsuya Hamada

Joichi Nishimura

Kenji Kamei

Satoshi Yamamoto

Masaki Iwami

Masao Tsuji

Masayoshi Shiga

Masayuki Itaba

Yasuo Imanishi

Yoshinori Kokabu

A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block includes a pair of carrier platforms and a transport section. A carrier storing a plurality of substrates in multiple stages is placed in each of the carrier platforms. The transport section includes transport mechanisms. The transport mechanisms concurrently transport the substrates.

Substrate processing apparatus

A substrate transport mechanism receives two substrates from an upstream ID section using two arms of three arms. The substrate transport mechanism delivers one of the two substrates to and from an individual processing unit of a processing block using one of arms holding the one of the two substrates to be subjected to a given process by the processing block and one of the arms holding no substrate. The substrate transport mechanism then keeps holding the other substrate with the remaining one arm of the arms having received the substrates while the processing unit processes the substrate. The substrate transport mechanism transfers the two substrates to a downstream processing block using the one arm holding the substrate subjected to the given process by the processing block and the one arm holding the other substrate.

Substrate treating apparatus and substrate transporting method

In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.

Exposure device, substrate processing apparatus, method for exposing substrate and substrate processing method

LEDs in an LED display part are arranged so as to have approximately the same placing form as containers. When a chemical solution in a container is exhausted, a corresponding LED of the LED display part lights up. Prior to an operation of replacing the container, an operator allows a bar code reader to read a bar code of an unused container. A bar code reader collator collates the bar code data of the unused container with the bar code data of a container corresponding to the lighting LED, which is already registered in a data base. When the bar code reader collator judges that the chemical solutions in the both containers are identical, the display of the LED is changed from a lighting-up display to a flashing display. This makes it easy to recognize the disposing position of the empty container to be replaced, thereby effectively preventing incorrect replacement of the container.

A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.

Substrate processing apparatus having regulated power consumption and

An interface apparatus is disposed between a processing unit for performing varied treatments on substrates before and after exposure of the substrates, and an exposure unit for performing the exposure. The interface apparatus includes first and second substrate transfer robots, and a substrate storage having a plurality of storage racks for storing a plurality of substrates. The first substrate transfer robot transfer substrates between the processing unit and substrate storage while the second substrate transfer robot transfers substrates between the substrate storage and exposure unit. Each of the robots is operable independently of and parallel to the other robot. The first transfer robot may be omitted, and when it is so omitted, a substrate transport robot in the processing unit performs the functions of the first transfer robot.

Substrate transfer method and interface apparatus

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Kyoto, Japan

Kazuhiro Nishimura