Nitto-Denko Corporation

Kazuhiro Nakajima

Tomotake Nashiki

Hideo Sugawara

Kodai Miyamoto

Hiroaki Kishioka

Tsuyoshi Chiba

Tomohide Banba

Masahiro Ooura

Satoshi Yasui

Katsunori Shibuya

A conductive film () includes: a resin film base () having a hard coat layer () on one main surface of a resin film (); an underlying layer () on a hard coat layer-formed surface of the resin film base; and a metal thin film () on the underlying layer. The underlying layer includes at least one layer of inorganic dielectric thin film. The hard coat layer contains first fine particles having an average primary particle diameter of 10 to 100 nm. In a cross section of the hard coat layer, the proportion of an area occupied by the first fine particles is preferably 10% or more.

Conductive film, method for manufacturing conductive film, and temperature sensor film

Provided is an electroconductive film having a metal thin-film on a resin film base; and a temperature sensor film which is obtained by patterning the metal thin-film on the resin film base. An electroconductive film () which is used for the production of a temperature sensor film comprises a metal thin-film () on one principal surface of a resin film base (), with a chromium oxide thin-film () serving as an underlying layer interposed therebetween. A temperature sensor film is obtained by patterning the metal thin-film so as to form a thermometric resistor part and a lead part that is connected to the thermometric resistor part.

Electroconductive film and temperature sensor film

An electroconductive film () comprises a metal thin-film () on a first main surface of a flexible substrate () that includes a resin film (). The thickness of the flexible substrate is 1 mm or less. The absolute value |H−H| of the difference between the heating dimensional change rate Hof the electroconductive film and the heating dimensional change rate Hof a film obtained by removing the metal thin-film from the electroconductive film is preferably 0.10% or less. There is a tendency that undulation of a temperature sensor film after patterning of the metal thin-film is further suppressed as the value of |H−H| decreases.

Electroconductive film, method for manufacturing same, temperature sensor film, and method for manufacturing same

The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a patterned transparent conductive layer formed on one side of the transparent film substrate; and a colored layer provided on at least one of an opposite side of the transparent conductive layer from the transparent film substrate and an opposite side of the transparent film substrate from the transparent conductive layer, wherein the colored layer has an average absorptance of from 35% to 90% for light in the wavelength range of from 380 nm to 780 nm.

Transparent conductive film and touch panel

The present invention provides a transparent conductive film in which the difference in visibility between the pattern portion and the pattern opening portion is kept small even when a transparent conductive layer is patterned. The transparent conductive film has a first dielectric layer, a second dielectric layer, and a transparent conductive layer in this order on a transparent film substrate, a thickness dof the first dielectric layer is larger than a thickness dof the second dielectric layer, the thickness dof the first dielectric layer is 8 to 40 nm and the thickness dof the second dielectric layer is 5 to 25 nm, and a difference between the thickness dof the first dielectric layer and the thickness dof the second dielectric layer, d-d, is 3 to 30 nm.

The present invention provides a transparent conductive film in which occurrence of scratches during sliding is suppressed even when transparent conductive layer forming surfaces are so arranged as to face each other. Provided is a transparent conductive film comprising a transparent film base; at least one dielectric layer formed on a first main surface of the transparent film base; and a transparent conductive layer formed on the dielectric layer, wherein the transparent conductive layer is patterned; and the surface on the first main surface of the transparent conductive film has an arithmetical mean roughness Ra of 22 nm or more, and has 140/mmor more of protrusions having heights of 250 nm or higher at a pattern-opening part in which the transparent conductive layer is not formed.

A capacitive touch sensor laminate for use in a display panel device includes: a dielectric central substrate structure made of a transparent resin material and formed to have flat surfaces, respectively, on opposite sides thereof; a at least one-layer structured coat layer made of a transparent material, formed on each of the flat surfaces, and including at least one refractive index adjusting layer for suppressing visibility of an electrode pattern formed by the transparent electrically conductive layer; and a transparent electrically conductive layer formed on and in adjacent relation to the coat layer. The at least one-layer structured coat layers formed on respective ones of the flat surfaces are configured such that thicknesses of corresponding layers therein on respective opposite sides of the dielectric central substrate structure are set to allow the corresponding layers to become mutually symmetrical across the dielectric central substrate structure.

Capacitive touch sensor laminate for display panel device

A display panel device has a window, a touch panel laminate and a display panel. The touch panel laminate has: a transparent first substrate layer; a first transparent conductive layer laminated to the first substrate layer through a first undercoat layer; a transparent second substrate layer; and a second transparent conductive layer laminated to the second substrate layer through a second undercoat layer. The second conductive layer faces the first conductive layer through at least the first substrate layer and the first undercoat layer. The first conductive layer is closer to the window than the first substrate layer. A polarizing film layer is bonded to the window, and a &#x3bb;/4 retardation film layer is disposed between the polarizing film layer and the touch panel laminate. The display panel is disposed on a side opposite to the window with respect to the touch panel laminate.

Display panel device having touch input function

The transparent conductive film of the present invention is a transparent conductive film, comprising a transparent film substrate, and a first transparent dielectric layer, a second transparent dielectric layer and a transparent conductive layer that are formed on one or both sides of the transparent film substrate in this order from the transparent film substrate side, wherein the transparent conductive layer is patterned, the relation n&#x3c;n&#x3c;nis satisfied, wherein nis the refractive index of the first transparent dielectric layer, nis the refractive index of the second transparent dielectric layer, and nis the refractive index of the transparent conductive layer, the first transparent dielectric layer has a thickness of from 2 nm to less than 10 nm, the second transparent dielectric layer has a thickness of from 20 nm to 55 nm, and the transparent conductive layer has a thickness of from 15 nm to 30 nm.

Transparent conductive film, transparent conductive laminate, touch panel, and method for producing transparent conductive film

The transparent conductive film of the present invention is a transparent conductive film, comprising a transparent film substrate, and a first transparent dielectric layer, a second transparent dielectric layer and a patterned transparent conductive layer that are formed on one or both sides of the transparent film substrate in this order from the transparent film substrate side, wherein the transparent conductive layer has a thickness of 31 nm or more, the first transparent dielectric layer has a thickness of from 7 nm to 16 nm, the second transparent dielectric layer has a thickness of from 30 nm to 60 nm, and the relation n&#x3c;n&#x2266;nis satisfied, wherein nis the refractive index of the first transparent dielectric layer, nis the refractive index of the second transparent dielectric layer, and nis the refractive index of the transparent conductive layer.

Growing community of inventors

Ibaraki, Japan

Kazuhiro Nakajima