Kabushiki Kaisha Toshiba

Kazuhiro Murakami

Makoto Honda

Hisashi Kaneko

Hirokazu Ezawa

Hideaki Harakawa

Hideto Matsuyama

Masanori Numano

Takahito Nagamatsu

Kaori Yomogihara

Yukifumi Oyama

Shinya Fukayama

A method for manufacturing a semiconductor device includes determining a position of a first semiconductor chip having a plurality of first electrodes, using one or more first alignment marks formed on the first semiconductor chip, determining a position of a second semiconductor chip having a plurality of second electrodes, using one or more second alignment marks formed on the second semiconductor chip, moving the second semiconductor chip relative to the first semiconductor chip, based on the determined positions of the first and second semiconductor chips, such that the second electrodes are aligned with the first electrodes, after said moving, stacking the second semiconductor chip on the first semiconductor chip, such that the first electrodes are electrically connected to the second electrodes, and calculating a misalignment amount between the first semiconductor chip and the second semiconductor chip stacked thereon.

Manufacturing method of semiconductor device and semiconductor manufacturing apparatus

An insulating film formed on a conducting layer is dry-etched so as to make a connection hole in the insulating film to expose the conducting layer. Plasma is supplied onto the exposed conducting layer to dry-clean a damage layer produced in the connection hole. A product produced in the connection hole as a result of the dry cleaning is removed by a wet process. An oxide film formed in the connection hole as a result of the wet process is etched by a chemical dry process using a gas including either NFor HF. A thermally decomposable reaction product produced as a result of the etching is removed by heat treatment.

Method of manufacturing a semiconductor device from which damage layers and native oxide films in connection holes have been removed

Growing community of inventors

Oita, Japan

Kazuhiro Murakami