Canon Kabushiki Kaisha

Kazuhiro Jindai

Toshikazu Ohnishi

Miki Tamura

Hideto Yokoi

Toshihiko Takeda

Keisuke Yamamoto

Takashi Mori

Masataka Yamashita

Yasue Sato

Masaru Kamio

Hitoshi Oda

Yuji Tsuruoka

Hideshi Kawasaki

Hisaaki Kawade

Takahiro Oguchi

Nobuhito Yamaguchi

Kazuo Iwata

Masao Furukawa

Mineto Yagyu

Hidehito Takayama

Tsuyoshi Takegami

Seiichi Kamiya

Eiichi Motai

The present invention provides liquid ejection head enables a reduction in the distance between a print medium and an ejection port formation face of the liquid ejection head on which an ejection port is formed, improving the landing accuracy of droplets ejected from the liquid ejection head. A print head according to the present invention includes an element substrate and a supporting member. A supporting portion is located in the space between the element substrate and the supporting member. Connection wiring is formed on the supporting portion. The connection wiring is provided which connects wiring inside of the supporting member provided in the supporting member to the heat generating element.

Liquid ejection head and method for manufacturing liquid ejection head

A foreign matter detecting apparatus includes a detecting device for detecting foreign matter by measuring smoothness of a surface of an object undergoing measurement, a marking device for providing a dent on the surface of the object with a predetermined horizontal distance from the foreign matter detected by the detecting device, and a mass spectrum measuring device for irradiating and scanning a small area with a primary ion beam, as a part of the object, including the foreign matter and the dent, so as to measure a mass spectrum of secondary ions emitted from the foreign matter located at a position within a predetermined horizontal distance from the dent.

Foreign matter or abnormal unsmoothness inspection apparatus and foreign matter or abnormal unsmoothness inspection method

A surface analysis apparatus includes a unit configured to bombard a sample surface with at least two types of ions having different sizes; a measurement device for measuring, with a time-of-flight secondary ion mass spectrometer, a mass spectrum of ions emitted from the sample surface; and an information processor outputting a difference between two mass spectra measured by bombardment of different types of ions.

Surface analysis apparatus and method using ion bombardment

A foreign matter or abnormal unsmoothness inspection apparatus is constituted by a detecting member for detecting a foreign matter or abnormal unsmoothness by measuring smoothness of a surface of a substrate-like measuring object, a marking device for providing an dent on the surface of the measuring object with a predetermined horizontal distance from the foreign matter or abnormal unsmoothness, and a mass spectrum measuring device for measuring a mass spectrum of secondary ion emitted from a position with a predetermined distance from the dent by detecting the dent through impact and scanning of the surface of the measuring object with a primary ion beam.

An alignment unit and an alignment method for aligning needle-like structures. The alignment unit includes a substrate having a surface and grooves defined in the surface. The grooves are sized and arranged such that when the needle-like structures are received therein, the needle-like structures are aligned.

Method for aligning needle-like structures and alignment unit

This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate () having a conductor (), a vessel () which has a gas inlet port () and a gas exhaust port () and covers a partial region of the surface of the substrate (); a gas inlet unit () connected to the gas inlet port () to introduce gas into the vessel, an exhaust unit () connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit () for applying a voltage to the conductor.

Manufacturing method of an image forming apparatus

It relates to a method of manufacturing an electron source. In an activation process, a set value of an activation gas partial pressure is switched at multi-stages and an application of a compensation voltage is not conducted for a predetermined period after switching of the set value. Alternatively, the activation is repeated plural times while a row wiring or a column wiring is switched, and the application of the compensation voltage is not conducted for the predetermined period after switching of the row wiring or the column wiring. Thus, activation processing can be uniformly performed for all electron emitting devices.

Method of manufacturing an electron source

A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the gas in the second process, with the second process being the last activation process.

Electron-emitting device, electron source, and manufacture method for image-forming apparatus

A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.

Method of manufacturing electron-emitting device, electron source and image-forming apparatus, and apparatus of manufacturing electron source

Method of fabricating electron-emitting device, electron source and image-forming apparatus using the electron source

This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate ( ) having a conductor ( ), a vessel ( ) which has a gas inlet port ( ) and a gas exhaust port ( ) and covers a partial region of the surface of the substrate ( ); a gas inlet unit ( ) connected to the gas inlet port ( ) to introduce gas into the vessel, an exhaust unit ( ) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit ( ) for applying a voltage to the conductor.

Growing community of inventors

Yokohama, Japan

Kazuhiro Jindai