Omron Corporation

Kazuhiro Io

Koji Sugita

Tomokazu Imae

A cleaning apparatus may include a cleaning unit that is kept from moving downwardly from a predetermined limit position. The apparatus body includes a positioning member that positions the cleaning unit at the limit position. The cleaning unit includes an intake nozzle that is arranged at a position separated from the surface to be cleaned by a predetermined gap, a cam member that holds the cleaning unit at the limit position, and an operation input unit that changes the limit position to a higher position by moving the cleaning unit upward by operating the cam member.

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Tokyo, Japan

Kazuhiro Io