Konica Corporation

Konica-minolta Holdings, Inc.

Mitsui Engineering and Shipbuilding Company Limited

Saturn Licensing LLC

Kazuhiro Fukuda

Takashi Murakami

Yoshikazu Kondo

Toshio Tsuji

Kiyoshi Oishi

Hiroaki Arita

Chikao Mamiya

Akira Nishiwaki

Yoshiro Toda

Shunichi Iwamaru

Yumi Muramatsu

Toru Kobayashi

Toshiya Takagi

Atsushi Saito

Akihiko Ito

Daisuke Kawamura

Nobuyuki Takiyama

Wataru Mizuno

Yasuo Morohoshi

Toru Iwasaki

Takakazu Kiyomura

Hiromoto Ii

Yuichiro Maehara

Issei Suzuki

Koji Fukazawa

Toshikazu Inaba

Norio Tezuka

Tatsuo Nakatani

Mitsuru Komori

Yoshiaki Matsumoto

Koji Ozaki

Yasuo Moroboshi

A method for manufacturing a transparent gas barrier film for an organic electroluminescence element having a substrate with a gas barrier layer thereon. The gas barrier layer is formed on the substrate by plasma CVD using an organic silicon compound as a raw material gas and an oxygen gas as a decomposition gas. Formation of the gas barrier layer is carried out so that a carbon content of the gas barrier layer in the thickness direction repeatedly changes more than two times from high value, via intermediate value, low value and intermediate value, to high value.

Method for manufacturing a transparent gas barrier film

Disclosed is a transparent gas barrier film having good transparency and good gas barrier properties, which exhibits excellent adhesion even after storage under severe environmental conditions, and does not deteriorate even when a large impact is applied thereto. The transparent gas barrier film is characterized by having, on a resin base, at least two layers having different elastic moduluses. The transparent gas barrier film is further characterized in that the elastic modulus difference between adjoining layers is not less than 1 GPa but not more than 20 GPa, and each layer has a thickness of not less than 1 nm but not more than 10 nm.

Transparent gas barrier film and method for producing transparent gas barrier film

A gas barrier laminate comprising a substrate having thereon at least a gas barrier layer and a polymer layer, wherein at least one polymer layer is provided adjacent to at least one gas barrier layer; and an average carbon content of the polymer layer at a contact interface between the gas barrier layer is lower than an average carbon content in the polymer layer.

Gas barrier laminate and production method of the same

A transparent gas barrier film comprising a substrate having thereon a gas barrier layer comprising at least a low density layer and a high density layer, wherein one or more intermediate density layers are sandwiched between the low density layer and the high density layer.

Transparent gas barrier film

A gas barrier film comprising a resin substrate provided thereon at least one layer of a ceramic film, wherein the density ratio Y (=&#x3c1;f/&#x3c1;b) satisfies 1&#x2267;Y&#x2267;0.95 and the ceramic film has a residual stress being a compression stress of 0.01 MPa or more and 100 Mpa or less, wherein &#x3c1;f is the density of the ceramic film and &#x3c1;b is the density of a comparative ceramic film being formed by thermal oxidation or thermal nitridation of a metal as a mother material of the ceramic film so as to being the same composition ratio of the ceramic film.

Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film

A moistureproof cellulose ester film which has satisfactory optical performances, excellent moisture permeability, and excellent dimensional stability; and a protective film for polarizers which comprises the film. This moistureproof cellulose ester film comprises: a cellulose ester film and, deposited on at least one side thereof in the following order, one or more adhesion layers each having a carbon content in terms of atom number concentration of 1-40% and comprising an inorganic compound as the main component, one or more barrier layers each having a carbon content in terms of atom number concentration of 0.1% or lower, comprising silicon oxide as the main component, and having a film density of 2.16-2.60, and one or more protective layers each having a carbon content in terms of atom number concentration of 1-40% and comprising an inorganic compound as the main component. The total thickness of these deposit layers on one side is 1-100 nm. It is characterized in that the barrier layers on one side have a thickness of 0.1-30 nm.

Moistureproof cellulose ester film, polarizer-protective film, and polarizer

A method for forming a film comprising a first process and a second process, the first process comprising the steps of: supplying a discharge gas to a first discharge space where high frequency electric field A is generated at or near atmospheric pressure, whereby the discharge gas is excite; transferring energy of the excited discharge gas to a film forming gas, whereby the film forming gas is excited; and exposing a substrate to the film forming gas to form a film on the substrate, and the second process comprising the steps of: supplying a gas containing an oxidizing gas to a second discharge space where high frequency electric field B is generated at or near atmospheric pressure, whereby the gas containing the oxidizing gas is excite; and the film formed in the first process is exposed to the excited gas containing the oxidizing gas.

Method for forming thin film and base and having thin film formed by such method

A film forming method comprising: supplying a reactive gas comprising a compound including a metal atom between facing electrodes; arranging a substrate between the electrodes; making the reactive gas in a plasma state by applying a voltage between the electrodes under atmospheric pressure or under a pressure in a vicinity of the atmospheric pressure and discharging; and forming a metal film on a surface of the substrate by supplying a reducing gas having a reducing property into a plasma atmosphere in which the reactive gas in the plasma state exists.

Film forming method employing reactive and reducing gases and substrate formed by the method

A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cmat a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.

Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus

A protective film for a polarizing plate is disclosed in which an contact angle of the surface in contact with a polarizer with respect to pure water is less than 55&#xb0; and the surface in contact with a polarizer becomes hydrophilic due to a plasma treatment.

Protective film for polarizing plate

A method of forming a layer or layers are disclosed which comprises the steps of transporting a substrate having a first surface and a second surface on the side opposite the first surface to a gap formed between a first electrode and a second electrode opposing each other, the second surface having a coefficient of kinetic friction of not more than 0.9; and subjecting the first surface of the substrate to plasma discharge treatment to form the layer at atmospheric pressure or at approximately atmospheric pressure while supplying a reactive gas to the gap.

Thin film forming method, optical film, polarizing film and image display method

A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency &#x3c9;of the second high frequency electric field is higher than frequency &#x3c9;of the first high frequency electric field, strength Vof the first high frequency electric field, strength Vof the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V&#x2267;IV&#x3e;Vor V&#x3e;IV&#x2267;V, and power density of the second high frequency electric field is not less than 1 W/cm.

Layer formation method, and substrate with a layer formed by the method

A protective film for polarizing plate is disclosed in which an contact angle of the surface in contact with a polarizer with respect to pure water is less than 55&#xb0; and the surface in contact with a polarizer becomes hydrophilic due to a plasma treatment. In such a manner, the protective film for the polarizing plate is readily adhered with a polyvinyl alcohol film employed as a polarizer and can be produced employing processing which is safe in work and does not adversely affect the environment. Thus highly efficient protective film for the polarizing plate, which exhibits excellent adhesion with a polyvinyl alcohol film, and a polarizing plate employing the same, are provided.

Growing community of inventors

Tokyo, Japan

Kazuhiro Fukuda