Kabushiki Kaisha Toshiba

Toshiba Memory Corporation

Funai Electric Company Ltd.

Mitsui Toatsu Chemicals, Incorporated

Kioxia Corporation

Matsushita Electric Industrial Co., Ltd.

Panasonic Corporation

Nitto-Denko Corporation

Mitsubishi Denki Kabushiki Kaisha

Mitsui Chemicals, Inc.

Interuniversitair Micro-Elektronica Centrum Vzw

Kazuhiko Yamamoto

Kunifumi Suzuki

Tadashi Asanuma

Kenji Aoyama

Satoshi Ishikawa

Yusuke Arayashiki

Takuya Konno

Yosuke Murakami

Shigeto Oshino

Shigenori Hayashi

Takeshi Yamaguchi

Yusuke Kobayashi

Shigeki Kobayashi

Takayuki Yamada

Tsukasa Nakai

Tsunehiro Ino

Kei Watanabe

Shinichi Nakao

Hiroyuki Fukumizu

Yasuhiro Nojiri

Kaoru Kawanishi

Hirotsugu Suzuki

Kana Hirayama

Junko Ohnaka

Yoshiko Tokura

Yoshio Ozawa

Ichiro Mizushima

Masumi Saitoh

Yoshihiro Sato

Kenji Yoneda

Shosuke Fujii

Takeshi Ishizaki

Takehiro Onomatsu

Takeo Inoue

Yasuyuki Baba

Kensuke Ota

Hiroki Tokuhira

Takahiko Fujisaka

Yasuhiro Satoh

Yoshiki Kamata

Tateyo Sasaki

Masaru Moriwaki

Yukihiro Nomura

Michimasa Kondo

Marina Yamaguchi

Motoya Kishida

Hideki Inokuma

Tomotaka Ariga

Mitsuru Ito

Kazuyuki Yahiro

Shoji Yamamoto

Kouichi Hashimoto

Yuzo Akada

Katsumi Ichikawa

Ryuzaburo Usui

Masafumi Iwamoto

Koji Usuda

Kenji A{dot Over (o)}yama

Bairu Yan

According to one embodiment, a memory device includes a first electrode, a second electrode, and a resistive layer provided between the first electrode and the second electrode, containing at least one of antimony (Sb) and bismuth (Bi) as a first element, and tellurium (Te) as a second element, and having a variable resistance value. The resistive layer includes a first layer having a hexagonal crystal structure containing the first element and the second element. The first layer contains a group 14 element as a third element.

Memory device

A memory device including a first conductive layer; a second conductive layer; a resistance change region provided between the first conductive layer and the second conductive layer; a first region provided between the resistance change region and the first conductive layer, the first region including a first element selected from the group consisting of niobium, vanadium, tantalum, and titanium, and a second element selected from the group consisting of oxygen, sulfur, selenium, and tellurium, the first region having a first atomic ratio of the first element to the second element; and a second region provided between the first region and the resistance change region, the second region including the first element and the second element, the second region having a second atomic ratio of the first element to the second element, the second atomic ratio being smaller than the first atomic ratio.

Memory device with a plurality of metal chalcogenide layers

A memory device according to an embodiment includes first and second interconnects, memory cells, and a control circuit. In a first process, the control circuit applies a write voltage of a first direction to a memory cell coupled to selected first and second interconnects, and applies a write voltage of a second direction to a memory cell coupled to the selected first interconnect and a non-selected second interconnect. In second processes of first to m-th trial processes, the control circuit applies the write voltage of the second direction to the memory cell coupled to the selected first and second interconnects, and omits a write operation in which the memory cell coupled to the selected first interconnect and the non-selected second interconnect is targeted.

Memory device and method having a control circuit configured to acquire information on a state of a control target, causes the control target to execute a read and write operation based on the state

According to an embodiment, a memory device includes a first conductive layer extending in a first direction, a second conductive layer extending in the first direction, a third conductive layer extending in a second direction intersecting with the first direction, an insulating layer provided between the first conductive layer and the second conductive layer, and a dielectric layer provided between the first conductive layer and the third conductive layer, and between the insulating layer and the third conductive layer, the dielectric layer having a first thickness thinner than a second thickness, the first thickness being a thickness between the first conductive layer and the third conductive layer, the second thickness being a thickness between the insulating layer and the third conductive layer, and the dielectric layer including an oxide including at least one of hafnium oxide and zirconium oxide.

Ferroelectric memory device

According to one embodiment, a nonvolatile memory device includes a first wiring extending in a first direction, a second wiring extending in a second direction, a third wiring extending in the second direction and spaced from the second wiring in the first direction. An insulating layer includes a first portion between the second wiring and the third wiring, and a second portion protruding from the first portion in a third direction. A chalcogenide layer is between the first wiring and the second wiring, the first wiring and the third wiring, and also the first wiring and the insulating layer. The chalcogenide layer includes a first layer portion, a second layer portion, and a third layer portion. A concentration of a first element in the third layer portion is higher than that in the first and second layer portions.

Nonvolatile memory device

A memory device includes a crystal-including layer including a first metal, and a germanium-and-oxygen including layer contacting the crystal-including layer. At least a portion of the crystal-including layer is crystallized. The germanium-and-oxygen including layer includes germanium and oxygen.

A memory device is described. A first conductive layer extends in a first direction. A second conductive layer extends in the first direction. A third conductive layer extends in a second direction intersecting the first direction. A first oxide region is disposed between the first conductive layer and the third conductive layer and between the second conductive layer and the third conductive layer. A semiconductor region is disposed between the first conductive layer and the first oxide region and between the first conductive layer and the second conductive layer. A second distance between the semiconductor region, which is disposed between the first conductive layer and the second conductive layer, and the third conductive layer, is longer than a first distance between the semiconductor region, which is disposed between the first conductive layer and the first oxide region, and the third conductive layer.

According to one embodiment, a semiconductor memory device includes a substrate, a first signal line, a first conductive layer, a first storage layer and a first insulation layer. The first signal line extends in a first direction crossing the substrate. The first conductive layer extends in a second direction crossing the first direction and being parallel to the substrate, and has a first surface and a second surface that is away from the first signal line in a third direction crossing the first and second directions. The first storage layer is provided between the first signal line and the first conductive layer. The first insulation layer is provided between the second surface and the first storage layer.

Semiconductor memory device

A storage device includes a first conductor, a resistance variable film, and a second conductor. The resistance variable film includes a first layer and a second layer. The second layer is located on a side opposite to the first conductor with respect to the first layer, contains oxygen, and has conductivity higher than that of the first layer. The second conductor includes a first portion and a second portion. The first portion abuts on the second layer of the resistance variable film. The second portion is separated from the resistance variable film as compared to the first portion. The oxygen content of the first portion is higher than that of the second portion.

Storage device

A semiconductor memory device includes a stacked body including insulating layers and gate electrode layers alternately stacked in a direction, a semiconductor layer extending in the direction, and a gate insulating layer provided between the semiconductor layer and the gate electrode layer, and including a first layer, a second layer, and a third layer between the first layer and the second layer. The first layer includes a first insulator, the second layer includes at least one oxide selected from aluminum oxide, yttrium oxide, lanthanum oxide, gadolinium oxide, ytterbium oxide, hafnium oxide, and zirconium oxide, the third layer includes at least one material selected from silicon, germanium, silicon germanium and silicon carbide, and the third layer is positioned between the semiconductor layer and the insulating layer.

According to one embodiment, a nonvolatile semiconductor memory device includes a first interconnect layer provided above a semiconductor substrate; a plurality of second interconnect layers provided above the first interconnect layer; a semiconductor layer electrically coupled to the first interconnect layer; a first insulating layer provided between the semiconductor layer and the plurality of second interconnect layers; and a plurality of first oxide layers in which one side of the first oxide layers is in contact with the plurality of second interconnect layers while the other side of the first oxide layers is in contact with the first insulating layer, and a voltage is applied to the plurality of second interconnect layers to vary a resistance value.

Nonvolatile semiconductor memory device

According to embodiments, a semiconductor memory device includes a first electrode, a second electrode, a memory cell, and a control circuit. The memory cell is provided between the first electrode and the second electrode and includes a metal film and a resistance change film. The control circuit applies a voltage between the first electrode and the second electrode to perform transition of a resistive state of the memory cell. The control circuit performs a first writing operation by applying a first pulse having a voltage of a first polarity to the memory cell and applying a second pulse having a voltage of the first polarity smaller than the voltage of the first pulse to the memory cell continuously after applying the first pulse.

A storage device includes: a first conductive layer; a second conductive layer; and a resistance-variable layer disposed between the first conductive layer and the second conductive layer, and including a first chalcogenide containing a first element which is either silicon or germanium. An insulating layer is disposed in a second direction perpendicular to a first direction from the first conductive layer to the second conductive layer with respect to the resistance-variable layer. A first region is disposed between the resistance-variable layer and the insulating layer, and has a third concentration of the first element higher than both a first concentration of the first element in the resistance-variable layer and a second concentration of the first element in the insulating layer.

According to one embodiment, a memory device includes a first electrode; a variable resistance layer provided on the first electrode, the variable resistance layer including a chalcogenide compound having a crystal structure; and a second electrode provided on the variable resistance layer. The variable resistance layer includes a first region covering one of an upper surface of the first electrode or a lower surface of the second electrode, and a second region, a concentration of the chemical element being lower in the second region than in the first region.

A storage device includes a first conductive layer, a second conductive layer, a first variable resistance layer, and a control circuit. The control circuit is configured to apply a first voltage between the first conductive layer and the second conductive layer for a first time and apply a second voltage less than the first voltage for a second time longer than the first time after the application of the first voltage when the first variable resistance layer is in a first high resistance state. The control circuit is further configured to apply the first voltage between the first conductive layer and the second conductive layer and apply a third voltage less than the second voltage between the first conductive layer and the second conductive layer after the application of the first voltage when the first variable resistance layer is in a first low resistance state.

Storage device and control method thereof

Growing community of inventors

Yokkaichi Mie, Japan

Kazuhiko Yamamoto