Rigaku Corporation

Other

Chubu Electric Power Company, Inc.

Kazuhiko Omote

Yoshiyasu Ito

Kiyoshi Ogata

Licai Jiang

Hiroshi Motono

Sei Yoshihara

Boris Verman

Shigematsu Asano

Katsutaka Horada

Naoki Matsushima

Tetsuya Ozawa

Hideaki Takahashi

Makoto Kambe

Tetsuo Kikuchi

Yuriy Platonov

Ryuji Matsuo

Jimpei Harada

Shiro Umegaki

Kazuki Ito

Sensui Yasuda

Akifusa Higuchi

Shuichi Kato

Katsuhiko Inaba

Seiichi Hayashi

Naohisa Osaka

Takeshi Osakabe

Ladislav Pina

Ryouichi Yokoyama

Yoshinori Ueji

Takao Kinefuchi

Ryotaro Yamaguchi

Tomoyasu Ueda

Muneo Yoshida

Masashi Kawasaki

Hideomi Koinuma

Shintaro Kobayashi

Katsuhiko Shimizu

Hideo Toraya

Masahiro Nonoguchi

Satoshi Murakami

Asao Nakano

Akihiro Himeda

Toru Mitsunaga

Naoki Kawahara

Go Fujinawa

Keiichi Morikawa

Kamihisa Endo

Takashi Yamada

Tsutomu Tada

Akito Sasaki

Yoshihiro Takeda

Akihiro Ikeshita

Bonglea Kim

Adolf Inneman

Kenji Wakasaya

Tetsuo Kani

Shinya Kikuta

Atsunori Kiku

Hajime Fujimura

Tomoyuki Iwata

Toshifumi Higuchi

Daisuke Kobayashi

Raita Hirose

Masahiro Tsuchiya

Takeshi Fujimura

Yoshihiko Takeda

Martin Horvarth

Jiri Marsik

Vaclav Jelinek

Kazuaki Shimizu

A damage measurement technique capable of measuring damage of a sample in a single crystal state, regardless of the surrounding condition, includes irradiating microbeam white X-rays to a sample in a single crystal state, diffraction of a spot generated by the irradiation is detected, a coefficient on variance of an intensity distribution in a specific direction in the detected diffraction spot is calculated, and a damaged state of the sample is specified based on the calculated coefficient.

Damage measurement method, apparatus and program, and x-ray diffraction apparatus

A transmission type small-angle scattering device of the present invention includes a goniometerincluding a rotation arm. The rotation armis freely turnable around a θ-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation armbeing defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unitis installed on a lower-side end portion of the rotation arm, and a two-dimensional X-ray detectoris installed on an upper-side end portion of the rotation armto form a vertical arrangement structure.

Transmissive small-angle scattering device

Provided is a scattering measurement analysis method including obtaining a theoretical scattering intensity from a structural model that contains a lot of scatterers, wherein the obtaining of a theoretical scattering intensity includes obtaining a contribution to the theoretical scattering intensity of a pair of a scatterer 'm' and a scatterer “n” existing at a distance “r” from the scatterer “m” among a plurality of scatterers by at least one of calculations in accordance with the distance “r”, the calculations including a first calculation of calculating contributions of the scatterer “m” and the scatterer “n” from respective scattering factors f(q) and f*(q) and a center-to-center distance rbetween the scatterer “m” and the scatterer “n”, and a second calculation of substituting the scattering factor f*(q) of the scatterer “n” by a first representative value and substituting a probability density function of the number of scatterers existing at the distance “r” by a constant value.

Scattering measurement analysis method, scattering measurement analysis device, and non-transitory computer-readable storage medium storing scattering measurement analysis program

An imaging type X-ray microscope capable of enlarging a numerical aperture even with high energy X-rays and acquiring a magnified image with sufficient intensity even in a laboratory. The imaging type X-ray microscope comprises an X-ray irradiation unit having a microfocal and high-power X-ray source and a condenser mirror for focusing and irradiating the emitted X-rays toward a sample, a sample holding unit for holding the sample, a reflecting mirror type X-ray lens unit for imaging X-rays transmitted through the sample, and an imaging unit for acquiring the imaged X-ray image, wherein each mirror constituting the condenser mirror and the reflecting mirror type X-ray lens unit has a reflecting surface formed with a multilayer film having a high reflectivity in X-rays of a specific wavelength.

Imaging type X-ray microscope

Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.

Total reflection x-ray fluorescence spectrometer

A transmission type small-angle scattering device of the present invention includes a goniometerincluding a rotation arm. The rotation armis freely turnable around a &#x3b8;-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unitis installed on a lower-side end portion of the rotation arm, and a two-dimensional X-ray detectoris installed on an upper-side end portion of the rotation armto form a vertical arrangement structure.

This fluorescent X-ray analysis apparatus is provided with an X-ray irradiation unitfor irradiating a sample S with: X-rays, having an energy that exceeds the energy absorption edge value of Ag which is selected as a measurement target element, and that is no greater than the energy absorption edge value of Sn which is an adjacent element having a higher energy absorption edge value than Ag; and X-rays having an energy exceeding the energy absorption edge value of Sn which is selected as a measurement target element.

Fluorescent X-ray analysis apparatus comprising a plurality of X-ray detectors and an X-ray irradiation unit including a multi-wavelength mirror

Provided is a fine structure determination method capable of easily determining tilt angles of columnar scattering bodies that are long in a thickness direction, and provided are an analysis apparatus and an analysis program thereof. There is provided an analysis method for a fine structure of a plate-shaped sample formed to have columnar scattering bodies that are long in a thickness direction and periodically arranged, comprising the steps of preparing scattering intensity data from the plate-shaped sample, that is generated via transmission of X-rays; and determining tilt angles of the scattering bodies in the plate-shaped sample with respect to a reference rotation position at which a surface of the plate-shaped sample is perpendicular to an incident direction of the X-rays, based on the prepared scattering intensity data.

Analysis method for fine structure, and apparatus and program thereof

Provided is an analysis method for a fine structure, that is capable of determining shapes of scattering bodies that are long in a thickness direction of a plate-shaped sample; and provided are an apparatus and a program thereof. There is provided an analysis method for a fine structure of a plate-shaped sample formed to have scattering bodies that are long in a thickness direction and periodically arranged, comprising the steps of preparing data of a scattering intensity from the plate-shaped sample measured via transmission of X-rays at a plurality of &#x3c9; rotation angles; calculating a scattering intensity of the X-rays scattered by the plate-shaped sample under a specific condition; fitting the calculated scattering intensity to the prepared scattering intensity; and determining shapes of the scattering bodies for the plate-shaped sample, based on a result of the fitting.

Analysis method for fine structure, apparatus, and program

An X-ray inspection device of the present invention includes a sample placement unitfor placing a sample as an inspection target therein, a sample placement unit positioning mechanismfor moving the sample placement unit, a goniometerincluding first and second rotation membersthat rotate independently of each other, an X-ray irradiation unitinstalled on the first rotation member, and a two-dimensional X-ray detectorinstalled on the second rotation member. The sample placement unit positioning mechanismincludes a &#x3c7; rotation mechanismfor rotating the sample placement unitand a &#x3d5;-axis about a &#x3c7;-axis that is orthogonal to a &#x3b8;s-axis and a &#x3b8;d-axis at a measurement point P and extends horizontally.

X-ray inspection device

A hybrid inspection system of the present invention is an inspection system including a first inspection device () for inspecting a sample () based on X-ray measurement data obtained by irradiating the sample () with X-rays, and a second inspection device () for inspecting the sample () by a measuring method using no X-rays. The X-ray measurement data obtained by the first inspection device or an analysis result of the X-ray measurement data is output to the second inspection device (). In the second inspection device (), the structure of the sample () is analyzed by using the X-ray measurement data input from the first inspection device () or the analysis result of the X-ray measurement data.

Hybrid inspection system

An X-ray diffraction apparatus having a solar slit, and a method for preventing the diffraction image on a detector from spreading in the in-plane direction even when an X-ray irradiation region spreads over the sample surface due to measurement by GIXD, thereby allowing for measurement with a short measurement time and a high resolution. The soller slitincludes a plurality of metallic thin plates, each being perpendicular to the bottom surface, which are arcuately arranged with a predetermined angular interval between each other so as to pass X-rays in a radiating direction from a particular focus, the soller slit being provided to be used at a position through which X-rays diffracted on a sample surface pass, the particular focus being the center of a goniometer circle, the X-rays being irradiated on a sample at an angle for GIXD.

Soller slit, X-ray diffraction apparatus, and method

In an X-ray inspection device according to the present invention, an X-ray irradiation unitincludes a first X-ray optical elementfor focusing characteristic X-rays in a vertical direction, and a second X-ray optical elementfor focusing the characteristic X-rays in a horizontal direction. The first X-ray optical elementis constituted by a crystal material having high crystallinity. The second X-ray optical element includes a multilayer mirror.

X-ray inspecting device, X-ray thin film inspecting method, and method for measuring rocking curve

An X-ray generator includes: a line X-ray source; a multilayer film mirror; and a side-by-side reflecting mirror including two concave mirrors joined together so as to share a join line. A cross section of a reflecting surface of the multilayer film mirror has a parabolic shape, and a focus of the parabolic shape is located at the line X-ray source. Cross sections of reflecting surfaces of the two concave mirrors of the side-by-side reflecting mirror each have a parabolic shape, and each of focuses of the parabolic shapes is located on a side opposite to the multilayer film mirror. An extended line of the join line of the side-by-side reflecting mirror passes through the multilayer film mirror and the line X-ray source as viewed in a plan view.

X-ray generator and x-ray analysis device

Growing community of inventors

Akiruno, Japan

Kazuhiko Omote