Tokyo Ohka Kogyo Co., Ltd.

Kazuhiko Nakayama

Toshimasa Nakayama

Yusuke Nakagawa

Hidekatsu Kohara

Kousuke Doi

Nobuo Tokutake

Taku Nakao

Shinichi Hidesaka

Hiroyuki Ohnishi

Isamu Takagi

A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), in an organic solvent (C) containing methyl n-amyl ketone, wherein the component (E) is a dibasic acid.

Resist composition and method for forming resist pattern

A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent,

Method for removing resist pattern

Disclosed is an improved positive-working photoresist composition comprising an alkali-soluble resin as a film-forming agent and a quinone diazide group-containing compound as a photosensitive agent. The most characteristic feature of the inventive composition consists in the unique formulation of the alkali-soluble resin which is a combination of two or three kinds of novolac resins selected from novolac resins (a), (b1) or (b2) and (c1) or (c2), each of which is characterized by the unique formulation of the phenolic compounds as a mixture to be subjected to a condensation reaction with an aldehyde compound to form the novolac resin. Namely, the phenolic mixture for the novolac (a) consists of m- and p-cresols, the phenolic mixture for the novolac (b1) consists of m-cresol and a xylenol, the phenolic mixture for the novolac (b2) consists of m- and p-cresols and a xylenol, the phenolic mixture for the novolac (c1) consists of m-cresol and a trimethyl phenol and the phenolic mixture for the novolac (c2) consists of m- and p-cresols and a trimethyl phenol each in a specified molar proportion of the constituent phenolic compounds.

High-sensitivity positive-working photoresist composition

Growing community of inventors

Kawasaki, Japan

Kazuhiko Nakayama