Ihi Corporation

Tokyo Institute of Technology

Ushio Denki Kabushiki Kaisha

Kazuhiko Horioka

Kyohei Seki

Hajime Kuwabara

Takuma Yokoyama

Hiroshi Mizokoshi

Tomonao Hosokai

An LPP EUV light source includes a vacuum chamberthat is maintained in a vacuum environment; a gas jet devicethat forms a hypersonic steady gas jetof the target substance inside the vacuum chamber so as to be collected; and a laser devicethat collects and radiates a laser beamto the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting pointof the laser beam and EUV lightis emitted therefrom.

LPP EUV light source and method for producing the same

A plasma light source includes a pair of coaxial electrodesfacing each other, a radiation environment sustaining devicethat supplies a plasma medium into the insides of the coaxial electrodes and holds the coaxial electrodes at a temperature and a pressure suitable for plasma generation, and a voltage application devicethat applies a discharge voltage of an inverted polarity to each of the coaxial electrodes. Tubular dischargeis formed between the pair of coaxial electrodes and plasmais confined in an axial direction of the coaxial electrodes.

Plasma light source and plasma light generation method

Growing community of inventors

Tokyo, Japan

Kazuhiko Horioka