Matsushita Electric Industrial Co., Ltd.

Sumitomo Chemical Company, Limited

Panasonic Corporation

Kazuhiko Hashimoto

Noboru Nomura

Nobuyuki Yoshiike

Kenji Kawakita

Haruyoshi Osaki

Katsuya Morinaka

Taichi Koizumi

Masaaki Suzuki

Yasunori Uetani

Seigo Shiraishi

Masahiko Hashimoto

Hidetomo Nagahara

Takashi Hashida

Norihisa Takahara

Makoto Akita

Masayuki Endo

Ichiki Takemoto

Satoshi Yamaguchi

Tatsuro Masuyama

Isao Yoshida

Takashi Hiraoka

Masahiko Shimada

Hiroshi Moriuma

Mikio Nishio

Takayuki Miyagawa

Ryotaro Hanawa

Masumi Suetsugu

Toyokazu Fujii

Tadashi Miki

Mitsuru Sekiguchi

Shigeyuki Inoue

Yasunori Doi

Junji Shigematsu

Yoshiko Miya

Kenji Kida

Tetsuya Kawai

Kyoko Nagase

Koji Ichikawa

Masaru Sasago

Satoshi Yamamoto

Shinji Tanaka

Michikazu Matsumoto

Yuji Yoshida

Yoshihiko Hirai

Yasuo Yoshimura

Hiroyuki Ogino

Yoshiyuki Takata

Naofumi Nakatani

Kazuhiro Yamashita

Satoshi Kinoshita

Nobuo Ando

Hideki Omori

Kouji Toishi

Osamu Eguchi

Chinehito Ebina

Masanori Okuyama

Hidekazu Yamashita

Haruo Terai

Kunishige Edamatsu

Soon Shin Kim

Satoshi Matsueda

Atsushi Ueno

Makoto Imai

Wataru Uchiyama

Tomonori Mukaigawa

Ryuichi Kubo

Chihiro Kawaguchi

Takahiro Matuso

A compound represented by the formula (I): wherein Rrepresents a hydrogen atom etc., Rand Reach independently represent a hydrogen atom etc., Rrepresents a C1-C8 divalent hydrocarbon group, Rrepresents a single bond etc., and Rrepresents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.

Compound and chemically amplified positive resist composition

A compound of the present invention is represented by the formula (A); 

Compound, resin, resist composition and method for producing resist pattern

A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, Rrepresents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, Arepresents a single bond, &#x2014;(CH)&#x2014;CO&#x2014;O&#x2014;* or &#x2014;(CH)&#x2014;O&#x2014;CO&#x2014;(CH)&#x2014;CO&#x2014;O&#x2014;* wherein g, h and i each independently represent an integer of &#x2212;1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.

Photoresist composition

A polymer comprising a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein Ris independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein Rrepresents a hydrogen atom or a methyl group, Ris independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Polymer and resist composition comprising the same

An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, Rrepresents a C1-C30 aliphatic hydrocarbon group etc., Rrepresents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents &#x2014;CO&#x2014;O&#x2014; etc., Qand Qeach independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.

Oxime compound and resist composition containing the same

The present invention provides a chemically amplified positive composition comprising: wherein Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or &#x2014;(CH)&#x2014;CO&#x2014;X&#x2014;, k represents an integer of 1 to 4, X, X, Xand Xeach independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and a structural unit having a fluorine atom in a side chain, and

Chemically amplified positive resist composition

The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or &#x2014;(CH)&#x2014;CO&#x2014;X&#x2014;, k represents an integer of 1 to 4, X, X, Xand Xeach independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.

The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.

A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I):    

A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.

The invention provides a communication apparatus used inside a house, a communication system connected thereto, a communication process, and computer program used therefore. The communication apparatus of the present invention connected via a network to one or more terminal appliances in the house, communicates with the outside via two or more different communication configurations including a first communication configuration with a high speed digital transmission technique and a second communication configuration providing service for telephone subscribers. The communication apparatus is characterized in recognizing a situation thereby to disconnect the first communication configuration and to use only the second communication configuration for communication with the outside.

Communication apparatus of a home security system

A method for manufacturing an acoustic matching member, the acoustic matching member being incorporated into an ultrasonic transducer for transmitting and receiving ultrasonic waves, and including: at least two layers including a first layer and a second layer that have different acoustic impedance values from each other. The method for manufacturing including the steps of: filling voids of a porous member with a fluid filling material, and solidifying both the fluid filling material inside the voids and the surplus fluid filling material at the same time. The acoustic matching member does not have independent intermediate layers between the layers, so that delamination hardly occurs and the difficulty in the designing associated with the presence of intermediate layers can be avoided.

Method for manfacturing an acoustic matching member

A monitoring system for preventing crime in a home, includes a plurality of terminals for monitoring whether predetermined monitoring points are in a stationary or nonstationary state. Further, the monitoring system includes a central processing device for controlling the setting/canceling of alarm operations of the terminals. The central processing device has a communication unit that receives stationary/nonstationary information from the terminals and transmits predetermined information including commands to the terminals. Each terminal has a communication unit that transmits stationary/nonstationary information to the central processing device and receives the predetermined information from the central processing device. Thus bidirectional communication can be achieved between the central processing device and the terminals. The terminals may include a terminal with an emergency call unit which, in an emergency, calls or notifies another, and a terminal having a notification unit which indicates that a nonstationary state has been accepted by a predetermined point of contact.

Monitoring system

The present invention provides a chemically amplified positive resist composition comprising The present invention also provides a haloester derivative of the formula (XXI) and a process for producing the same 

Chemically amplified positive resist composition, a haloester derivative and a process for producing the same

The present invention provides a chemical amplification type positive resist composition comprising 

Chemical amplification type positive resist composition

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Moriguchi, Japan

Kazuhiko Hashimoto