Tokyo Ohka Kogyo Co., Ltd.

Kazuhide Uno

Takahiro Senzaki

Yasushi Washio

Koichi Misumi

Koji Saito

Mitsuaki Ohgake

A composition for forming an interlayer insulating film including a polymerizable monomer, an imide compound represented by general formula (z-1), a reaction promoter which promotes the polymerization of the polymerizable monomer and the imide compound, and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), Rand Rrepresent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Rrepresents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, Rand Rrepresent an alkyl group or an alkoxy group, and nand nare 0 or 1. 

Composition for forming interlayer insulating film, interlayer insulating film, method for forming interlayer insulating film pattern, and device

A composition for forming an interlayer insulating film including a polymerizable monomer, an alkali-soluble elastomer containing a polymerizable group, an imide compound represented by general formula (z-1), and a polymerization initiator, an interlayer insulating film containing a polymerized product thereof, a method for forming an interlayer insulating film pattern, and a device including the interlayer insulating film on a support. In the formula (z-1), Rand Rrepresent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Rrepresents a divalent organic group containing an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group, Rand Rrepresent an alkyl group or an alkoxy group, and nand nare 0 or 1. 

A photosensitive resin composition for forming an interlayer insulating film, which contains an alkali-soluble resin (A), a photosensitizer (B), a thermal acid generator (T) which generates an acid when heated, and a silane coupling agent (C), and wherein the alkali-soluble resin (A) has a constituent unit (A1) represented by general formula (a-1) or an alicyclic epoxy group-containing unit (A3). In general formula (a-1), R represents a hydrogen atom or a methyl group; and Rarepresents a hydrogen atom or an organic group having a hydroxyl group. 

Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film

Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist pattern, all of which are capable of obtaining a satisfactory resist pattern with high sensitivity even on a substrate having a portion formed of copper on an upper surface thereof. The chemically amplified positive-type photoresist composition for a thick film comprises component (A) which includes at least one compound capable of producing an acid upon irradiation with an actinic ray or radiation, and component (B) which includes at least one resin whose alkali solubility increases by the action of an acid, in which the component (A) includes an onium fluorinated alkyl fluorophosphate having a specific structure.

Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern

To provide a resin composition capable of forming a thin film layer so as to cause tenting over concave portions by conventional coating processes without depending on dry films, and also a coating method so as to cause tenting of the resin composition. A resin composition, which, by spin coating, causes tenting over concave portions formed on a substrate, the resin composition including a resin component (a) and a solvent (b) and has a viscosity of at least 200 cP, and tenting can be achieved by using the resin composition, allowing the resin composition to fall drop wise onto a substrate on which concave portions are formed, and spin coating the substrate at a rotating speed of 300 to 4000 rpm.

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Kawasaki, Japan

Kazuhide Uno