Kabushiki Kaisha Toshiba

Toshiba Electronic Devices & Storage Corporation

Kazuaki Yamaura

Takeshi Yamamoto

Nobuyuki Toda

Shinji Kawahara

Yuki Nakamura

Takashi Ishikawa

Hirofumi Nagano

Koji Shirai

Jun Morioka

Tsubasa Yamada

Yasunori Iwatsu

Kensuke Yasuda

Hiroaki Tajima

A semiconductor device includes a semiconductor layer of a first conductivity type, a first semiconductor portion of a second conductivity type provided in the semiconductor layer, first and second conductive members, each having an upper end reaching an upper surface of the semiconductor layer and a lower end connected to the first semiconductor portion, and first and second insulating films covering side surfaces of the first and second conductive members, respectively. A length from the upper end to the lower end of the first conductive member is greater than a total of a length of the first conductive member, a distance between the first conductive member and the second conductive member, and a length of the second conductive member in a direction from the first conductive member toward the second conductive member that is parallel to the upper surface of the semiconductor layer.

Semiconductor device with conductive members that extend from a semiconductor portion to an upper surface of a semiconductor layer

A semiconductor device includes: a semiconductor substrate; a first transistor provided at an upper surface of the semiconductor substrate; and a first capacitor provided above the first transistor and connected to a gate of the first transistor. A tunnel current is able to flow between the gate and the semiconductor substrate.

Semiconductor device

A light detection device is disclosed. A first cell and a second cell are set in the light detection device. The first cell and the second cell are mutually adjacent. The device includes: a first semiconductor layer of a first conductivity type; a second semiconductor layer provided on the first semiconductor layer, the second semiconductor layer being of a second conductivity type; a first member provided between the first cell and the second cell; a second member provided between the first member and the first cell; and a third member provided between the first member and the second cell. The first to third members are made of a material different from the first semiconductor layer and the second semiconductor layer.

Light detection device

A semiconductor device includes a semiconductor substrate, an insulating film provided on the semiconductor substrate, a first element disposed at least in a lower layer portion of the insulating film, a second element disposed at least in the lower layer portion of the insulating film, and a hydrogen barrier member provided on the semiconductor substrate. The hydrogen barrier member is made from a material transmitting hydrogen less easily than does a material of the insulating film. The hydrogen barrier member and the semiconductor substrate surround the second element. The hydrogen barrier member does not surround the first element.

According to one embodiment, the fifth semiconductor region contacts the first semiconductor region. The metal region is provided on the fifth semiconductor region. The first insulating film extends in a thickness direction of the semiconductor layer. The first insulating film is adjacent to the fourth semiconductor region, the third semiconductor region, the second semiconductor region, and the first semiconductor region. The second insulating film extends in the thickness direction of the semiconductor layer. The second insulating film is provided between the fourth semiconductor region and the first conductive unit, between the third semiconductor region and the first conductive unit, and between the second semiconductor region and the first conductive unit.

According to one embodiment, a semiconductor device includes a semiconductor substrate, a first conductivity type region, a device isolation insulating film, a second conductivity type region, and a low concentration region. The first conductivity type region is formed in part of the semiconductor substrate. The device isolation insulating film is formed in an upper surface of the semiconductor substrate and includes an opening formed in part of an immediately overlying region of the first conductivity type region. The second conductivity type region is formed in the opening and is in contact with the first conductivity type region. The low concentration region is formed along a side surface of the opening, has second conductivity type, has an effective impurity concentration lower than an effective impurity concentration of the second conductivity type region, and separates an interface of the first conductivity type region and the second conductivity type region from the device isolation insulating film.

Semiconductor device with zener diode and method for manufacturing same

According to one embodiment, a semiconductor device includes a semiconductor substrate and a first semiconductor element provided on the semiconductor substrate. The first semiconductor element includes: a first semiconductor; a second semiconductor layer; a third semiconductor layer; a first insulating layer; a first base region; a first source region; a first gate electrode; a first drift layer; a first drain region; a first source; and a first drain electrode. A concentration of an impurity element of the first conductivity type included in the first drift layer is lower than a concentration of an impurity element of the first conductivity type included in the first semiconductor layer. The concentration of the impurity element of the first conductivity type included in the first drift layer is higher than a concentration of an impurity element of the first conductivity type included in the second semiconductor layer.

A semiconductor device includes a diode formed by making use of a DMOS transistor structure. In addition to such a DMOS transistor structure, the semiconductor device includes a second buried layer of the first conductivity type being provided on a first buried layer of a second conductivity type that is in a floating state. Moreover, the second buried layer of the first conductivity type and a second diffusion region of the first conductive type are connected by a first diffusion region of the first conductivity type. A first electrode is set as anode, and a second electrode and a third electrode are short-circuited and set as cathode.

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Yokohama Kanagawa, Japan

Kazuaki Yamaura