Nikon Corporation

Nippon Steel Corporation

Nippon Kogaku K.k.

Kabushiki Kaisha Toshiba

Hitachi, Ltd.

Asahi Denka Kogyo Kabushiki Kaisha

Other

Taisho Pharmaceutical Co., Ltd.

The Japanese Research and Development Association for Bioreactor System

Kazuaki Suzuki

Tetsuo Taniguchi

Noriyuki Hirayanagi

Yasushi Maeda

Kenji Nishi

Yuji Imai

Tomoharu Fujiwara

Akikazu Tanimoto

Teruaki Okino

Yukio Kakizaki

Akio Idei

Toru Takeuchi

Shinji Wakamoto

Hidemi Kawai

Akira Wada

Yu Ohata

Eiji Nakai

Ken Okada

Shoji Maruzeni

Shigemasa Sato

Toru Nezu

Hirohito Tanabe

Satoshi Yamada

Yukiharu Miwa

Yoshihito Nakayama

Hajime Yamamoto

Yuji Ito

Hiroaki Tanaka

Yasuyuki Mimatsu

Hideo Mizutani

Koichi Matsumoto

Wataru Matsumoto

Kyoichi Suwa

Makoto Uehara

Kazuo Ushida

Saburo Kamiya

Toshio Matsuura

Shintaro Kawata

Yasuhiro Nakata

Toshihiko Tsuji

Shigeyasu Tsubaki

Jiro Inoue

Takashi Shirai

Satoru Anzai

Makoto Hamada

Yuichi Sakurai

Takehisa Yahiro

Tatsuo Yoneda

Yohei Kobashi

Sumito Shimizu

Junji Hazama

Madoka Kawamura

Masato Go

Tsunesaburo Uemura

Masato Hatasawa

Mikio Ushijima

Toshiyuki Hirokawa

Shin-ichi Kojima

Ryota Higashi

Tohru Isogami

Tooru Takeuchi

Ayako Bohno

Kosuke Funayama

Hiroshi Nakamura

The work support device stores information indicating a work order for each process, and information indicating a work area of a worker for each work in the process. A processor executes a specifying processing in which a target work to be performed by the worker is specified based on the information indicating the work order, a selection processing in which a target area where the target work specified by the specifying processing to be performed by the worker is selected based on the information indicating the work area, an identification processing in which a work performed by the worker is identified based on image data from a camera that captures an image of the area selected by the selection processing, a determination processing in which whether the worker has deviated from the work order is determined based on an identification result by the identification processing.

Work support device, work support method, and work support program

The present invention provides a compound represented by formula [I] shown below or a pharmaceutically acceptable salt thereof that has an inhibitory effect on 20-HETE producing enzyme. (in formula [I] above, the structure represented by formula [II] below: represents any of the structures represented by formula group [III] below: R, R, R, and Rindependently represent a hydrogen atom, a fluorine atom, methyl, or the like, Rrepresents any of the structures represented by formula group [IV]: 

Pyridine compound substituted with azole

A boiling refrigerant type cooling system to suppress overshoot upon start of heat generation and realize stable start of boiling. In the boiling refrigerant type cooling system, a metal boiling heat transfer unit has a base in thermal contact with a heat generating body. The boiling heat transfer unit is in contact with a liquid refrigerant. The boiling heat transfer unit has plural parallel tunnels communicating with the outside via holes or gaps under its surface, a groove deeper than a tunnel diameter formed through all the tunnels in an orthogonal direction to the tunnels, and a cover plate on the groove.

Boiling refrigerant type cooling system

Exposure apparatus are disclosed that can control, to high precision, exposure doses on a photosensitive substrate of a mask pattern defined on a reflective mask as the pattern is being exposed on the substrate using a projection-optical system. An exemplary apparatus includes a first illumination sensor for detecting light that is incident on a reflective mask from an illumination system and a second illumination sensor for detecting light that has propagated from the illumination system to a reference reflective surface on the reflective mask, reflected from the reference reflective surface, and arrived at an image surface of the projection-optical system. Calibration of the first sensor is performed based on detection data obtained by the first sensor and detection data obtained by the second sensor. Exposure of the substrate is controlled based on the detection data obtained by the calibrated first sensor.

Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same

A joint structure includes a splice plate and a gusset plate, which can prevent out-of-plane buckling of the gusset plate without the necessity of welding a stiffening rib plate thereon. The joint structure includes a gusset plate and at least one splice plate connected to the gusset plate. Each of the splice plates is constructed from section steel having a non-rectangular cross-section. The joint structure can be used in a building during assembly of the building or for reinforcement of the building.

Joint structure using a gusset plate, a building using the joint structure and a method of assembling or reinforcing a building

A column-and-beam join structure comprises connecting the column and beam with a pair of split tees. At least one split tee has a web with a portion of the web having a reduced cross-sectional area. The web with the reduced cross-sectional area is located between a flange of the beam and a buckling restraint. The buckling restraint is connected to the flange of the beam with bolts. The sides of the bolts are in the proximity to the side surface of the portion of the web of the split tee having the reduced cross-sectional area. Annular members may be arranged surrounding portions of the bolts that are in proximity to the side surface of the portion of the web having the reduced cross-sectional area.

Column-and-beam join structure

A damping brace having an axial force member for providing bearing forces against tensile or compressive forces, a constraining member for constraining the axial force member, and a stiffening part for supplementing the stiffness of the axial force member. An adhesion preventive coating is provided for preventing adhesion between the constraining member and the stiffening part. A length of the stiffening part extending along the axial direction and the gap between the stiffening part and the constraining member are defined in such a way as to prevent an end of the axial force member from rotating in the axial direction beyond a specific angle when the compressive force is applied to the force member.

Damping brace and structure

Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accuracy. The methods and apparatus are especially useful whenever a divided stencil reticle is used that includes complementary pattern portions.

Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same

Methods and devices are disclosed for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus. Based on the pattern-element densities of the exposure units to be transferred to the substrate, a relationship between the total blur and the beam semi-angle, the current density, and/or the beam-acceleration voltage is determined. An optimal beam semi-angle, current density, and/or beam-acceleration voltage is calculated to: (1) minimize the blur during the transfer-exposure of an exposure unit having a certain pattern-element density; (2) make the blur constant during the transfer-exposure of a group of exposure units having various pattern-element densities; or (3) maximize the patterned-beam current during the transfer-exposure of an exposure unit having a certain pattern-element density and blur tolerance. The beam semi-angle, current density, and/or acceleration voltage of the CPB-optical system is then adjusted to the calculated value.

Methods and devices for controlling blur resulting from the space-charge effect and geometrical aberration in a charged-particle-beam microlithography apparatus

Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position relative to the projection-lens system, with consequent errors in image focus, rotation and magnification. Apparatus and methods are disclosed for monitoring changes in axial height position of the reticle, to facilitate making compensatory changes. Representative apparatus include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy. Reticle-position data can be used to regulate one or more parameters of exposure and/or axial position of the reticle or wafer.

Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same

Methods are disclosed for performing charged-particle-beam (CPB, e.g., electron-beam) microlithography with reduced Coulomb effects being manifest in pattern images as formed on the surface of a sensitive substrate. The pattern is defined on a segmented reticle, which can be a scattering-stencil reticle or scattering-membrane reticle. In an embodiment, the beam current actually reaching the substrate, as a proportion of beam current actually passing through the reticle, is reduced to 50% or less during exposure of the pattern. To achieve this reduction, the pattern as defined on the reticle can be normal or inverted in tone as required, and the resist on the substrate can be positive or negative in tone as required. In an example embodiment, the beam current reaching the substrate is reduced by establishing an opening ratio of 50% or less for the pattern as a whole as defined on the reticle. The opening ratio is expressed as 100&lsqb;A /(A &plus;A )&rsqb;, wherein A is a total area of the reticle occupied by both the weakly scattering reticle membrane and the highly scattering layer, and A is a total area of the reticle occupied by only the weakly scattering reticle membrane.

Charged-particle-beam microlithography methods exhibiting reduced coulomb effects

The plant sterol-containing fat composition of the present invention contains a plant sterol fatty acid ester (A); and from 10 to 70% by weight of a partial glyceride (B). It can provide a cholesterol absorption inhibiting effect, and capable of ensuring no addition of an emulsifier or a reduction in amount of the emulsifier to be added when utilized for production of fat foods in the emulsion product form such as margarines, fat spreads, and whip creams, whereby an emulsion product having no or reduced flavor characteristic of the emulsifier can be obtained.

Vegetable sterol-containing fat compositions and process for producing the same

The present invention provides a column-and-beam join structure which absorbs energy caused by a large earthquake or the like by split tees surely yielding at a prescribed value, does not cause other members to fracture, and thus makes it possible to replace only the split tees which have become unusable, and, more specifically, a column-and-beam join structure constructed by attaching and connecting, using bolts the ends of both the upper and lower flanges of a steel beam (H-shaped steel beam) between the webs of a pair of upper and lower split tees the flanges of which are connected to a steel column using bolts The upper limit of the yield stress of the steel material used for the split tees is defined to be not more than twice the lower limit thereof. Further, in order for the web extending from the flange of a split tee in the axial direction of an H-shaped steel beam to absorb earthquake energy by its plasticization, the cross-sectional area of the web is reduced partially and the base end portion of the web is divided from the tip portion which is connected to the flange of the H-shaped steel beam

Projection-exposure apparatus and methods are disclosed that exhibit increased throughput by providing improved schemes by which the reticle stage and wafer stage move to accomplish exposure. Portions of a die pattern on a &ldquo;pattern original&rdquo; (e.g., reticle) are sequentially illuminated by an energy beam (e.g., beam of electromagnetic radiation or charged particles). The energy beam passes through the pattern portions and forms a demagnified image on a substrate through a projection-optical system. While moving the pattern original and the substrate, the entire die pattern is sequentially illuminated according to an exposure order, and the die pattern is demagnifyingly transferred to the substrate on which the images of the illuminated pattern portions are stitched together. When transferring and exposing the die pattern to multiple locations on the substrate, the exposure order is reversed after exposing each die pattern.

Projection-exposure methods and apparatus exhibiting increased throughput

Growing community of inventors

Tokyo, Japan

Kazuaki Suzuki