Sumco Corporation

Sumitomo Mitsubishi Silicon Corporation

Chlorine Engineers Corp., Ltd.

Echo Giken Co. Ltd.

Kazuaki Souda

Makoto Takemura

Yasuo Fukuda

Koichi Okuda

Masaaki Kato

Junichiro Iwahashi

Eiji Suhara

In the ozone water treatment process, the silicon wafer is treated with the first ultra-pure water that includes ozone. The first ultra-pure water is refined by the ultraviolet ray sterilization method. The first ultra-pure water includes total organic carbon content of more than 1 &#x3bc;g/liter and not more than 20 &#x3bc;g/liter, so that the silicon wafer of the predetermined degree of cleanliness is obtained. The silicon wafer is treated by using the second ultra-pure water that has a lower TOC value than the first ultra-pure water in the ultra-pure water rinsing process (including the chemical solution cleaning process as required). The second ultra-pure water is refined by the ultraviolet ray oxidization method, and includes total organic carbon content with a concentration of 1 &#x3bc;g/liter or less. Thus the silicon wafer of the predetermined degree of cleanliness is obtained.

Semiconductor wafer treatment method and apparatus therefor

An ultra-pure ozone water comprising an increased amount of an organic carbon capable of suppressing the reduction of the half-life period of ozone; and a method for producing the ultra-pure ozone water which comprises adding an organic solvent containing the above organic carbon to an ultra-pure ozone water containing a trace amount of the organic carbon. The above ultra-pure ozone water exhibits an increased half-life period of ozone, and thus, when used in cleaning a semiconductor substrate, allows the cleaning with an ozone water having an enhanced content of ozone, which results in exhibiting an enhanced cleaning capability and cleaning efficiency for an organic impurities, metallic impurities and the like adhered to the substrate, due to enhanced oxidizing action of ozone.

Technique on ozone water for use in cleaning semiconductor substrate

Growing community of inventors

Kashima, Japan

Kazuaki Souda