Canon Kabushiki Kaisha

Cannon Kabushiki Kaisha

Kazuaki Omi

Takao Yonehara

Kiyofumi Sakaguchi

Kazutaka Yanagita

Toshikazu Miyakogawa

This invention is to provide an apparatus for separating a substrate having a porous layer at the porous layer. A bonded substrate stack () having a porous layer () is supported by substrate holding portions () while being rotated. High-speed, high-pressure water (jet) is ejected from a nozzle (), so the jet is injected into the bonded substrate stack (). The substrate holding portions () hold the bonded substrate stack () such that the bonded substrate stack () can expand at its central portion due to the pressure of the injected water. This efficiently applies a force (separation force) that acts outward from the inside of the bonded substrate stack ().

Sample separating apparatus and method, and substrate manufacturing method

This invention prevents defects generated when a bonded substrate stack having a separation layer is separated. A bonded substrate stack ( ) having a porous layer ( ) is separated in two steps of the first and second processes. In the first process, a jet is ejected to the porous layer ( ) while rotating the bonded substrate stack ( ) to partially separate the bonded substrate stack ( ) while leaving the central portion of the porous layer ( ) as an unseparated region. In the second process, the jet is ejected to the porous layer ( ) while rotation of the bonded substrate stack ( ) is stopped. A force is applied to the unseparated region from a predetermined direction to completely separate the bonded substrate stack ( ). Also, the first region (peripheral portion) and second region (central portion) of the bonded substrate stack ( ) having the porous layer ( ) are separated using a jet and ultrasonic wave, respectively. More specifically, the first region is separated by a jet ejected from a nozzle ( ) while rotating the bonded substrate stack ( ). On the other hand, the second region is separated by an ultrasonic wave generated by an ultrasonic vibrator ( ).

Sample processing apparatus and method

This invention is to prevent a substrate from dropping when it is transferred/received to/from a separating apparatus. The support surfaces of substrate holding portions ( ) are made horizontal, and a substrate ( ) to be separated is mounted on one substrate holding portion ( ) in a horizontal state ( A). The substrate holding portions ( ) are pivoted about rotary shafts ( ), respectively, to make the support surfaces of the substrate holding portions ( ) vertical so that the substrate ( ) is sandwiched by the substrate holding portions ( ) ( B). The substrate holding portions ( ) are rotated about rotary shafts ( ), respectively, and simultaneously, high-pressure, high-speed water is ejected from an ejection nozzle ( ) to separate the substrate ( ) into two substrates ( ). The substrate holding portions ( ) are pivoted about the rotary shafts ( ), respectively, to make the support surfaces horizontal ( C). With this arrangement, the substrate can be supported from the lower side and transferred in the horizontal state.

Member separating apparatus and processing apparatus

This invention is to provide an apparatus for separating a substrate having a porous layer at the porous layer. A bonded substrate stack ( ) having a porous layer ( ) is supported by substrate holding portions ( ) while being rotated. High-speed, high-pressure water (jet) is ejected from a nozzle ( ), so the jet is injected into the bonded substrate stack ( ). The substrate holding portions ( ) hold the bonded substrate stack ( ) such that the bonded substrate stack ( ) can expand at its central portion due to the pressure of the injected water. This efficiently applies a force (separation force) that acts outward from the inside of the bonded substrate stack ( ).

An apparatus for separating a substrate having a porous layer at the porous layer is provided. A bonded substrate stack ( ) having a porous layer ( ) is supported by substrate holding portions ( ) while being rotated. High-speed, high-pressure water (jet) is ejected from a nozzle ( ) and injected against the bonded substrate stack ( ), thereby physically separating the bonded substrate stack ( ) into two substrates. The jet pressure is appropriately changed in accordance with progress of separation processing.

Object separating apparatus and method, and method of manufacturing semiconductor substrate

An apparatus for separating a substrate having a porous layer from the porous layer is provided. A bonded substrate stack having a porous layer is supported by substrate holders while being rotated. A jet nozzle ejects a high-speed, high-pressure liquid or water. The jet thrusts into the bonded substrate through a guide unit. The position in the x-axis direction of this guide unit is adjusted by a motor such that the jet is concentrated into the bonding interface of the bonded substrate stack.

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Yokohama, Japan

Kazuaki Omi