Jsr Corporation

Sharp Kabushiki Kaisha Corporation

Kazuaki Niwa

Hirofumi Sasaki

Masayoshi Suzuki

Shinji Shiraki

Isao Nishimura

Michinori Nishikawa

Hozumi Sato

Toshiyuki Ota

Masayuki Endo

Kazuki Kobayashi

Ikuo Sakono

Fumiko Yonezawa

Masako Suzuki

Hideki Chiba

A radiation sensitive resin composition for the formation of cathode separators for EL display devices which have heat resistance and adhesion required for cathode separators for EL display devices and an inversely tapered shape, cathode separators formed therefrom and an EL display device comprising the cathode separators. The radiation sensitive resin composition for the formation of cathode separators for EL display devices comprises (A) an alkali soluble resin, (B) the compound represented by the formulae (I) to (IV) and (C) a trihalomethyltriazine and/or an onium salt, the cathode separators are formed from the radiation sensitive resin composition and the EL display device comprises the cathode separators formed from the radiation sensitive resin composition.

Radiation sensitive resin composition, cathode separator and EL display device

The invention provides a radiation-sensitive resin composition, by which a patterned insulation film whose water repellency varies is easily formed with high precision, a process for forming a patterned insulation film using this composition, a display element and an flat-panel disply device using the composition, and a process for producing the flat-panel disply device. The resin composition comprises (A) an alkali-soluble copolymer, (B) a 1,2-quinonediazide compound and (C) a water-repellent siloxane resin in particular proportions. In the production process of the patterned insulation film, patterning exposure and development are conducted on a coating formed of the resin composition. The display element and flat-panel disply device are equipped with an interlayer insulation film formed by the resin composition. The production process of the flat-panel disply device comprises an interlayer insulation film-forming step including a treatment of patterning exposure exposing conductor layer-forming regions in an exposure that only surface layer portions are cured in one part thereof, and the whole in the thickness-wise direction thereof is cured in the other parts, and a conductor layer-forming step of forming conductor layers on the surface of the interlayer insulation film with a liquid material.

Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device

A radiation sensitive resin composition for forming a rib comprising (A) a copolymer of (a-1) hexafluoropropylene, (a-2) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a-3) an unsaturated compound other than the components (a-1) and (a-2), (B) an acid generating compound which generates an acid upon exposure to radiation, (C) a crosslinkable compound and (D) a fluorine-containing organic compound other than the component (A). A rib formed from the composition, a rib forming method, and an organic EL display element and liquid crystal display element having the rib. The rib does not cause a 'satellite' phenomenon when an organic EL layer or ITO transparent electrodes are formed by coating, and an organic EL display element and liquid crystal display element having the rib of the present invention are excellent in productivity and reliability.

Radiation sensitive resin composition, rib, rib forming method and display element

Radiation sensitive composition for forming an insulating film, insulating film and display device

Radiation-sensitive composition, insulating film and organic EL display element

A radiation sensitive resin composition comprising an alkali-soluble resin such as a polyvinyl phenol or a phenol resin other than a polyvinyl phenol having a weight average molecular weight of 2,000 or higher, a cross-linking agent such as an amino resin having two or more active methylol groups in a molecule, a particulate rubbery material comprising a cross-linked polymer chemically modified with an epoxy compound, a liquid rubbery material having a number average molecular weight between 1,000 and 10,000 and a glass transition temperature of -20.degree. C. or lower, and a radiation polymerization initiator. The composition is best suited for use as a material for preparing an insulating layer interposed between two layers of conductive wiring that are arranged in an overlaying stack.

Radiation sensitive resin composition

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Tokyo, Japan

Kazuaki Niwa