Kabushiki Kaisha Toshiba

Ebara Corporation

Other

Kazuaki Himukai

Manabu Tsujimura

Hiromi Yajima

Toyomi Nishi

Shoichi Kodama

Riichiro Aoki

Yukio Imoto

Gisuke Kouno

Tetsuji Togawa

Atsushi Shigeta

Shiro Mishima

Harumitsu Saito

Masako Watase

Tamami Takahashi

Takanobu Nishimura

A polishing apparatus for polishing a surface of a workpiece includes a housing unit, a partition wall partitioning an interior of the housing unit into a first chamber and a second chamber, a polishing section disposed in the first chamber and having a turntable with an abrasive cloth mounted on an upper surface thereof and a top ring positioned above the turntable for supporting the workpiece to be polished and pressing the workpiece against the abrasive cloth, and a cleaning section disposed in the second chamber and cleaning the workpiece which has been polished. The polishing apparatus further includes a transferring device for transferring the workpiece which has been polished from the polishing section to the cleaning section through an opening and an exhaust system for exhausting ambient air from each of the polishing section and cleaning section separately and independently.

Polishing apparatus

Polishing apparatus and a method of polishing and cleaning and drying a wafer

Polishing apparatus and method

A polishing apparatus includes a detachable light weight cloth cartridge which shows little deformation under uneven loading during a polishing operation. Either mechanical or non-mechanical fixation of the cloth cartridge to a turntable is achieved. Mechanical fixation involves attaching the cloth cartridge to the turntable at peripheral and center sections of the cloth cartridge. Non-mechanical fixation involves attaching the cloth cartridge to the turntable by a vacuum arrangement. The assembly of the cloth cartridge and the turntable not only produces excellent flatness on polished semiconductor wafers by maintaining a level polishing surface, but also improves the production yield by preventing breakage of wafers during the polishing process.

Polishing apparatus including cloth cartridge connected to turntable

Polishing aparatus and method

Growing community of inventors

Chigasaki, Japan

Kazuaki Himukai