Growing community of inventors

Kawasaki, Japan

Kazuaki Ebisawa

Average Co-Inventor Count = 1.70

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 7

Kazuaki EbisawaAkiya Kawaue (3 patents)Kazuaki EbisawaYasushi Kuroiwa (3 patents)Kazuaki EbisawaShota Katayama (3 patents)Kazuaki EbisawaYuta Yamamoto (2 patents)Kazuaki EbisawaYoshitaka Komuro (1 patent)Kazuaki EbisawaMasahito Yahagi (1 patent)Kazuaki EbisawaTakashi Kamizono (1 patent)Kazuaki EbisawaTatsuya Fujii (1 patent)Kazuaki EbisawaToshikazu Takayama (1 patent)Kazuaki EbisawaIssei Suzuki (1 patent)Kazuaki EbisawaYuki Fukumura (1 patent)Kazuaki EbisawaKazuaki Ebisawa (11 patents)Akiya KawaueAkiya Kawaue (43 patents)Yasushi KuroiwaYasushi Kuroiwa (8 patents)Shota KatayamaShota Katayama (6 patents)Yuta YamamotoYuta Yamamoto (5 patents)Yoshitaka KomuroYoshitaka Komuro (42 patents)Masahito YahagiMasahito Yahagi (22 patents)Takashi KamizonoTakashi Kamizono (17 patents)Tatsuya FujiiTatsuya Fujii (13 patents)Toshikazu TakayamaToshikazu Takayama (12 patents)Issei SuzukiIssei Suzuki (10 patents)Yuki FukumuraYuki Fukumura (7 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Tokyo Ohka Kogyo Co., Ltd. (10 from 1,235 patents)

2. Toyko Ohka Kogyo Co., Ltd. (1 from 5 patents)


11 patents:

1. 12312489 - Curable composition, cured product and method for forming insulating film

2. 11803122 - Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound

3. 11643389 - Method for producing maleimide compound, compound and solid resin

4. 11550221 - Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound

5. 11131927 - Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article

6. 11061326 - Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound

7. 11022880 - Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound

8. 11016387 - Chemically amplified positive-type photosensitive resin composition, method of manufacturing substrate with template, and method of manufacturing plated article

9. 10890845 - Chemically amplified positive-type photosensitive resin composition

10. 10509318 - Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated article

11. 10394122 - Resist composition, method for forming resist pattern, compound, and acid generator

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