Shin-Etsu Chemical Co., Ltd.

Toppan Printing Co., Ltd.

Kazuaki Chiba

Yukio Inazuki

Hiroki Yoshikawa

Satoshi Okazaki

Takashi Haraguchi

Yuichi Fukushima

Tadashi Saga

Yosuke Kojima

Sathoshi New Functional Materials Research Ctr Okazaki

Hiroki New Functional Materials Res Ctr  Yoshikawa

Yukio New Functional Materials Research Ctr Inazuki

A photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.

Photomask blank and photomask

A photomask blank comprises a transparent substrate, a light-shielding film deposited on the substrate and comprising a metal or metal compound susceptible to fluorine dry etching, and an etching mask film deposited on the light-shielding film and comprising another metal or metal compound resistant to fluorine dry etching. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.

Photomask blank and photomask making method

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Tokyo, Japan

Kazuaki Chiba