Jnc Corporation

Katsuyuki Sugihara

Setsuo Itami

Yuka Takahashi

Ayako Kikuchi

Toshiyuki Takahashi

Shinta Morokoshi

Takayuki Hirota

Kuniaki Arai

Kohsuke Yoshitomi

Yoshihiro Deyama

Shungo Kojima

Atsushi Murotani

Yuya Horikawa

Kyouko Kondou

Kazuki Yamauchi

A photocurable composition is capable of forming a cured product having good adhesiveness to an inorganic base material and having good ion migration resistance. The photocurable composition includes a monofunctional acrylic monomer (A) in an amount of 40 to 80 wt % relative to 100 wt % of the composition, a polyfunctional acrylic monomer (B) in an amount of 10 to 50 wt % relative to 100 wt % of the composition, and a hydroxyl value adjusting agent (C) in an amount of 0.1 to 30 wt % relative to 100 wt % of the composition, wherein the hydroxyl value of the composition is 1 to 100 mgKOH/g.

Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component

Provided are a thermosetting resin composition containing polyester amide acid (A), epoxy compound (B) having a fluorene skeleton, epoxy curing agent (C) and colorant (D), and the thermosetting resin composition capable of forming a cured film having an excellent balance of satisfactory hardness and adhesion to glass under high-temperature conditions, and also an application of the thermosetting resin composition.

Thermosetting resin composition, cured film, substrate with cured film, and electronic component

Provided is a highly versatile polymerizable composition that allows the fabrication equipment to be washed easily with water, allows the fabricated object to be removed easily from the support, and allows easy curing by application of light rays of 400 nm or higher, in optical 3D fabrication by lamination fabrication. A photopolymerizable composition for stereolithography containing a water-soluble radical polymerizable compound (A) represented by formula (1), a photopolymerization initiator (B) that generates radicals upon application of light rays of a wavelength of 400 nm or higher, and an ionic surfactant (C). In formula (1), Ris an organic group of valence a, a is an integer of 2 or higher, and Ris hydrogen or an alkyl having 1-6 carbon atoms. 

Polymerizable composition for stereolithography

Growing community of inventors

Ichihara, Japan

Katsuyuki Sugihara