Mitsubishi Chemical Corporation

Katsuya Funayama

Shuichi Kubo

Yutaka Mori

Hanako Kato

Keishin Handa

Masahiko Ono

Tatsushi Baba

Hisao Takeuchi

Takahiro Yoneyama

Junichi Oizumi

Kenichirou Motoda

Yoshio Wakayama

Tomoko Yamakawa

Takashi Fujiwara

A light guide plate for image display can display clear images even when a resin base is used. The Sight guide plate configured for image display may include a first resin base and a hologram layer. The first resin base may have an MC value of 0.120 or less, obtained by evaluation using shadow contrast, according to expression (1): wherein Lmax is a maximum value of brightness from a brightness distribution, Lmin is a minimum value of the lightness from the brightness distribution, and MC is an MC value that objectively represents a magnitude of a dip in low brightness portions in the brightness distribution.

Light guide plate for image display

An electroluminescent element wherein an electrode, an electroluminescent layer, a high-refractive-index layer(a transparent electrode layerA and an intermediate layerB) and a translucent bodyare sequentially laminated. On light-emitting-surface side of the high-refractive-index layerand the translucent body, layersA andB individually having a light-scattering function are provided respectively. The presence of the light-scattering layersA andB on the light-emitting-surface side of the high-refractive-index layerand the translucent bodyenables to emit light from the electroluminescent element through multiple scattering of guided light, which travels inside the translucent bodyin the planar direction while being totally reflected by the interface between the translucent bodyand air, and other guided light, which travels inside a thin film including the electroluminescent layerand the high-refractive-index layer

Electroluminescence element and lighting apparatus

Silica with a large pore volume, a large specific surface area, a narrow pore distribution, low contents of unwanted metal impurities, and excellent physical properties such as high heat-resistance and water-resistance is provided. The silica has a mode pore diameter (D) of 20 nm or less, and a solid-state Si nuclear magnetic resonance (hereinafter called solid-state Si NMR) spectrum of the silica includes a chemical shift (&#x3b4; ppm) of Qpeak meeting the following inequality (I).&#x2212;0.0705&#xd7;()&#x2212;110.36&#x3e;&#x3b4;&#x2003;&#x2003;(I) The silica with such properties can be suitably used in fields of which particularly excellent heat resistance and water resistance are required, and moreover controlled pore properties, and the fact that physical properties scarcely change over a long period of time are required among the above-mentioned applications.

Silica

Growing community of inventors

Kanagawa, Japan

Katsuya Funayama