Showa Denko K.k.

Katsutoshi Morinaka

Hiroshi Uchida

Toshio Fujita

Kaneo Nozawa

Katsumi Murofushi

Hiromoto Ohno

Toshio Ohi

Hideo Miyata

Kohei Morikawa

Hirotoshi Kamata

Haruaki Ito

Toru Sasaki

Hiroyuki Monzen

Tsutomu Nozawa

Yoshikazu Arai

Katsumasa Hirose

Satoru Ishigaki

Yoshio Miyajima

Kazuyoshi Hoshi

There is provided a fluorine-containing compound purification method for obtaining a high-purity fluorine-containing compound by efficiently separating and removing hydrogen chloride from a fluorine-containing compound that contains hydrogen chloride, i.e., from a crude fluorine-containing compound. The fluorine-containing compound purification method of the present invention comprises the following steps (1) and (2) in this order:

Fluorine-containing compound purification method

The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si&#x2014;H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.

Epoxy group-containing organosiloxane compound, curable composition for transfer materials and method for forming micropattern using the composition

A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.

Fine pattern transfer material

There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1):CH&#x2550;CH&#x2014;COO&#x2014;R&#x2014;NCO&#x2003;&#x2003;(1)(wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).

Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same

The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, Rrepresents a hydrogen atom or a methyl group, A represents &#x2014;OR&#x2014; or a bond, Rrepresents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, Rrepresents a linear or branched alkylene group having 1 to 6 carbon atoms, and Rrepresents a linear or branched alkyl group having 1 to 6 carbon atoms.)

(Meth) acryloyl group-containing oxetane compound and production method thereof

The invention aims to provide a method whereby (meth)acrylate derivatives having an isocyanate group can be obtained in high yield by dehydrochlorination of 3-chloropropionate derivatives having an isocyanate group under industrially advantageous and mild conditions, and the content of residual hydrolyzable chlorine can be reduced. A method for producing a (meth)acrylate derivative having an isocyanate group comprises performing dehydrochlorination of a 3-chloropropionate derivative having an isocyanate group in the presence of a basic nitrogen compound having a tertiary nitrogen, the tertiary nitrogen of the basic nitrogen compound having at least one group other than an aromatic ring group.

Method for producing (meth)acrylate derivative having isocyanate group

There are provided a novel ethylenically unsaturated group-containing isocyanate compound, a process for producing the same, and a reactive monomer produced from the isocyanate compound, a reactive polymer and its use. The ethylenically unsaturated group-containing isocyanate compound according to the present invention is represented by formula (I). 

Ethylenically unsaturated group-containing isocyanate compound and process for producing the same, and reactive monomer, reactive (meth) acrylate polymer and its use

A process for preparing a high purity (meth)acryloyloxyalkyl isocyanate having a very small hydrolyzable chlorine content is provided. The high purity (meth)acryloyloxyalkyl isocyanate is prepared by subjecting a hydrolyzable chlorine containing (meth)acryloyloxyalkyl isocyanate to mixing treatment with an epoxy compound and an amine at a temperature of from 110 to 160&#xb0; C. to prepare a mixture; and preparing a high purity (meth)acryloyloxyalkyl isocyanate from the resulting mixture with distillation. In particular, it is possible to effectively prevent (meth)acryloyloxyalkyl isocyanate from polymerization during the distillation by adding a polymerization inhibitor such as phenothiazine and the like.

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Minato-ku, Japan

Katsutoshi Morinaka