Toshiba Memory Corporation

Kabushiki Kaisha Toshiba

Katsumi Yamamoto

Keisuke Kikutani

Fumitaka Arai

Katsuyuki Sekine

Satoshi Nagashima

Atsushi Murakoshi

Tatsuya Kato

Tomoya Oori

Kohei Sakaike

Chihiro Abe

Shunichi Takeuchi

A semiconductor device includes a substrate, a stacked body provided on the substrate, a first insulator dividing the stacked body in a second direction crossing the first direction, a second insulator adjacent to the first insulator and dividing the stacked body in the second direction, a first hole, and a first insulating member. In the stacked body, a plurality of layers are stacked in a first direction perpendicular to the upper surface of the substrate. The first hole penetrates the stacked body and the first insulator in the first direction. The first insulating member penetrates the stacked body and the second insulator in the first direction and is adjacent to the first hole via a first electrode in a third direction crossing the first direction and the second direction, and has an opening diameter larger than that of the first insulator.

Semiconductor device and manufacturing method thereof

A method for manufacturing a semiconductor device includes forming a first mask layer having a first opening on an underlying layer; forming a first layer in a space where the underlying layer is selectively removed via the first opening; forming a second mask layer on the first mask layer and the first layer, the second mask layer having a second opening crossing the first opening; and selectively removing the first layer at a portion where the first opening and the second opening cross. At least one of the first and second mask layers having openings including the first or second opening, the openings being arranged in the first mask layer along a first direction, and/or being arranged in the second mask layer along a second direction, the first opening crossing the second opening in the first direction, and the second opening crossing the first opening in the second direction.

Method for manufacturing semiconductor device

A semiconductor memory device includes a first structural body, a second structural body and interconnections. The first and the second structural bodies are separated in a first direction and extend in a second direction. The interconnections are provided between the first structural body and the second structural body, extend in the second direction, and are separated from each other along a third direction. The first and the second structural bodies each includes an insulating member, a column-shaped body and an insulating film. The insulating member and the column-shaped body are disposed in an alternating manner along the second direction and extend in the third direction. The insulating members of the first and second structural bodies make contact with the interconnections.

Semiconductor memory device and method for manufacturing same

A method for manufacturing a semiconductor device includes forming an insulating layer on a semiconductor layer; forming a metal layer on the insulating layer; and forming a first interconnect by selectively etching the metal layer. The first interconnect is electrically connected to the semiconductor layer and has a loop configuration. The method includes forming a first mask layer covering the first interconnect and the insulating layer; and forming a second mask layer on the first mask layer. The second mask layer has a first opening over a portion of the first interconnect. The method further includes exposing the portion of the first interconnect by selectively removing the first mask layer using the second mask layer; and forming a second interconnect by selectively removing the portion of the first interconnect using the first mask layer. The second interconnect has two ends and is electrically connected to the semiconductor layer.

Semiconductor device and method for manufacturing same

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Yokkaichi, Japan

Katsumi Yamamoto