Kobe Steel, Ltd.

Dainippon Screen Mfg. Co., Ltd.

Kabushiki Kaisha Kobe Seiko Sho

Other

Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)

Katsumi Watanabe

Kimitsugu Saito

Yusuke Muraoka

Ikuo Mizobata

Yoshihiko Sakashita

Ryuji Kitakado

Shogo Sarumaru

Hisanori Oshiba

Masahiro Yamagata

Tomomitsu Nakai

Makoto Yoneda

Yoichi Inoue

Tomomi Iwata

Takahiko Ishii

Eiji Fukatsu

Hiroyuki Ueno

Itaru Masuoka

Hideshi Yamane

Nobuyuki Kawakami

Takayuki Okawa

Hideki Adachi

Shigeo Kofune

Tetsuya Yoshikawa

Takashi Miyake

Yasuo Manabe

Jun Munemasa

Katsuyuki Iijima

Kaoru Masuda

Kazuya Suzuki

Takashi Gama

Tomoya Minamino

Fumika Kawahara

Yasuo Okuyama

Provided is a temperature measuring instrumentfor a high temperature and pressure furnace having a structure capable of preventing relative displacement of an insulating tubewith respect to a pair of metal bodiesand. A distal end engaging portionis provided in an axial direction end portion of the insulating tube. The temperature measuring instrumentis additionally provided with connecting membersandwhich connect distal end portions of the pair of metal bodiesandto one another. The insulating tubeis locked to the connecting membersandat the distal end engaging portionin such a way as to restrict relative displacement in the circumferential direction with respect to the pair of metal bodiesand

Temperature measuring instrument for high temperature and pressure furnace

Provided is a hot isostatic pressing (HIP) device that improves the heat uniformity of a hot zone during a pressurization process of an object being processed. This HIP device () is provided with: an outer casing () having an open outer opening part (H); an inner casing () having an open inn opening part (H); a heat-insulating body (R) disposed between the outer casing () and the inner casing (); a gas flow generation part (); and a plurality of first gas conduits (), A hot zone (P) in which a pressurization process is performed is formed inside the inner casing (). During the pressurization process, a low-temperature pressurization medium gas which has been generated by the gas flow generation part () and has passed through the first gas conduits () moves upward in an inner flow passage (L) between the casings, and then flows into the hot zone (P) from the inner opening part (H), Even when the pressurization medium gas leaks from the vicinity of a bottom all part () and flows into the hot zone (P), the heat uniformity of the hot zone (P) is maintained.

Hot isostatic pressing device

Provided is a hot isostatic pressing (HIP) device () that can efficiently cool a hot zone during HIP processing while restraining temperatures in the lower part of a high-pressure container. This HIP device () is provided with the following: gas-impermeable casings () that surround an object to be processed (W); a heating unit () that is disposed inside these casings and forms a hot zone around the object to be processed (W); a high-pressure container (); and a cooling unit that guides a pressure-medium gas cooled on the outside of the casings into the hot zone to cool the hot zone. The cooling unit comprises the following: a gas introduction unit that introduces the pressure-medium gas that has been cooled on the outside of the casings () into the hot zone; and a cooling promotion unit () that cools the pressure medium gas by causing the pressure-medium gas that has been cooled on the outside of the casings to exchange heat with a base () of the high-pressure container ().

Provided is a hot isostatic pressing device (HIP) () that enables prompt cooling in a processing chamber. The HIP device () is provided with the following: gas impermeable casings (); a heating unit (); a high-pressure container (); a heat accumulator () provided below a processing chamber; and a cooling promotion flow path (). The casings () are disposed so as to form the following: a first circulation flow () in which a pressure medium gas passes through an inner flow path () and an outer flow path () and then returns to the inner flow path (); and a second circulation flow () in which the pressure medium gas which has branched off from the first circulation flow () performs heat exchange with an object-of-processing (W) in the processing chamber and then is fed back to the first circulation flow (). In the cooling promotion flow path (), the pressure medium gas that is in the second circulation flow () and that has performed heat exchange with the object-of-processing (W) is guided to the heat accumulator () and cooled by the heat accumulator () before the pressure medium gas merges with the first circulation flow ().

Disclosed is a process for producing porous materials by replacing a first solvent in a wet material containing the first solvent with a second solvent in a high pressure condition and drying the resulting wet material which process comprises a mixed solvent feeding step for feeding a mixed solvent composed of a solvent identical to or of the same kind as the first solvent and the second solvent to the wet material.

Process for producing porous object and apparatus therefor

A hot isotropic pressure device including: a casing disposed inside a high-pressure container; a heating unit provided inside the casing and forms a hot zone around the treatment material, in which an isotropic pressure treatment is performed on the treatment material using a pressure medium gas. A cooling unit is provided to cool the hot zone by guiding the pressure medium gas, cooled while guided from the upper side toward the lower side at the outside of the casing, into the hot zone. The cooling unit includes a gas introducing unit which guides the pressure medium gas cooled at the outside of the casing from the lower portion of the high-pressure container to the upper portion of the hot zone without any intersection with the pressure medium gas inside the hot zone and introduces the pressure medium gas into the hot zone.

Hot isotropic pressure device

The objective is to provide a high-pressure treatment apparatus with which the pressure or temperature in a treatment chamber can be efficiently adjusted in a short period of time without an overall significant increase in the size or complication of the apparatus. The high-pressure treatment apparatus has a pressure-resistant container having pressure-resistant walls surrounding a treatment chamber, a lid member that closes an open end of the pressure-resistant container, a supply means that supplies a process fluid into the treatment chamber, a partition wall that is thinner than the pressure-resistant wall and is provided along the inside surface of said pressure-resistant container to form a partitioned chamber with said inside surface, and a heat transfer control means. Said heat transfer control means controls heat transfer between said treatment chamber and said partitioned chamber by heating or cooling a heating medium outside the container and feeding said heating medium into said partitioned chamber.

High-pressure treatment apparatus

A hot isostatic pressing device according to the present invention includes an inner casing, an outer casing, and a heating means which are provided inside a high-pressure container. The device further includes a first cooling means for forcedly circulating pressure medium gas in such a manner that pressure medium gas guided upwardly between the inner casing and the outer casing is guided to the outside of the outer casing through an upper part of the outer casing, cooled while being guided downwardly along an inner circumferential surface of the high-pressure container, and then returned to between the inner casing and the outer casing through a lower part of the outer casing; and a second cooling means for guiding pressure medium gas within a hot zone formed inside the inner casing to the outside of the hot zone, cooling the pressure medium gas guided to the outside by merging it with the pressure medium gas forcedly circulated by the first cooling means, and returning the cooled pressure medium gas into the hot zone. According to such a structure, a high cooling efficiency can be attained while maintaining the hot zone in a thermally uniform condition.

Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.

High pressure processing method and apparatus

After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unitA,B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unitby a primary transport robot. The supercritical drying unitperforms a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

Substrate processing method, substrate processing apparatus and substrate processing system

A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

High pressure processing method

A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring apparatus includes a temporarily holding member, and transfers the article from the intermediate position to the processing position after receiving the article carried by the carrier device at an intermediate position distanced from the holder and temporarily holding it. The temporarily holding member is retracted to a position in the outside of the processing vessel after the article is transferred.

Method and apparatus for transferring an article to be processed and processing apparatus

When the hatch of a substrate washing chamberis opened to receive a substrate, certain valves are closed, and a valve is opened, supply COto purge the substrate washing chamberto and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamberso that the COexpels any gas and unwanted air from the substrate washing chamberand the conduits. Thereafter, super critical COis used to wash the substrate and clean the circulation line. The flow of supercritical COis sent to the substrate washing chamber. After flowing through the circulation line, including a circulation channel, it passes through a bypass channelto a decompressor. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bathtogether with the flow.

High pressure processing apparatus and method

When the hatch of a substrate washing chamberis opened to receive a substrate, certain valves are closed, and one valve is opened, to supply COto purge the substrate washing chamberto and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamberso that the COexpels any gas and unwanted air from the substrate washing chamberand the conduits. Thereafter, supercritical COis used to wash the substrate and clean the circulation line. The flow of supercritical COis sent to the substrate washing chamber. After flowing through the circulation line, including a circulation channel, it passes through a bypass channelto a decompressor. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bathtogether with the flow.

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Takasago, Japan

Katsumi Watanabe