Horiba, Ltd.

Horiba Stec, Co., Ltd.

Tokyo Electron Limited

Katsumi Nishimura

Kyoji Shibuya

Masakazu Minami

Daisuke Hayashi

Toshio Ohta

Kensuke Fukushiro

Kazuhide Hasebe

Atsushi Endo

Nobutake Nodera

Kotaro Takijiri

Yuhei Sakaguchi

Yoshitake Ando

Shigeru Nakatani

Masaki Inoue

Makoto Umeki

Yusuke Awane

Yukio Sakai

Makoto Yoshida

Jan Poppe

The present invention is intended to reduce variations in oscillation wavenumber of a semiconductor laser element due to the influence of circumferential temperatures. The invention includes a semiconductor laser semiconductor laser element, a temperature control part to control a temperature of the semiconductor laser element, a temperature sensor to detect a temperature of the temperature control part, and a temperature control device to control a supply signal to the temperature control part so that a detected temperature obtained from the temperature sensor reaches a predetermined target temperature. The temperature control device changes a target temperature for the temperature control part depending on a supply signal to the temperature control part.

Semiconductor laser device, and method and program for driving the same

The present invention relates to an analysis apparatus adapted to analyze a measurement target component contained in a sample by irradiating a measurement cell into which the sample is introduced with pulse-oscillated light, whereby suppressing reduction in wavelength resolution without shortening the pulse width. The analysis apparatus includes multiple light sources adapted to produce pulse oscillations, a light detector adapted to detect light emitted from the light source and transmitted through the measurement cell, and a signal separation part adapted to separate, from a light intensity signal obtained by the light detector, signals corresponding to a part of pulses from the light sources.

Analysis apparatus and analysis method

The present invention is adapted to include: a light source adapted to emit reference light that is light whose wavelength is modulated at a predetermined modulation frequency; a light detector adapted to detect the intensity of measurement target light that is light after the reference light has transmitted through the measurement target component, and the intensity of the reference light; a first calculation part adapted to calculate an intensity ratio logarithm that is the logarithm of the ratio between the intensity of the measurement target light and the intensity of the reference light; a frequency component extraction part adapted to lock-in detect the intensity ratio logarithm with a reference signal having a frequency n times the modulation frequency; and a second calculation part adapted to, on the basis of the result of the detection by the frequency component extraction part, calculate the concentration or absorbance of the measurement target component.

Analysis apparatus, program for analysis apparatus, and analysis method

The present invention is a spectroscopic analyzer that when measuring the concentration of a predetermined component contained in sample gas in a reduced pressure state lower than atmospheric pressure, obtains the concentration of the predetermined component with accuracy. The spectroscopic analyzer is one that measures the absorbance of the predetermined component contained in the sample gas in a reduced pressure state lower than atmospheric pressure, and calculates the concentration of the predetermined component with use of a calibration curve indicating the relationship between the absorbance of the predetermined component and the concentration of the predetermined component and a relational expression between the pressure of the sample gas at the time of the measurement and the concentration of the predetermined component. In addition, in a graph with one axis as pressure axis and the other axis as concentration axis, the relational expression has an intersection point other than zero with the pressure axis.

Spectroscopic analyzer and spectroscopic analysis method

The present invention responds flexibly to and corrects concentration changes that are caused by changes between the temperature when a correction calibration curve is created and the temperature when a test sample is measured, without having to correct the calibration curve. More specifically, a spectrophotometer measures concentrations of measurement target components contained in a test sample from an optical spectrum obtained by irradiating light onto the test sample, and includes a concentration calculation unit that calculates concentrations of the measurement target components from the optical spectrum using a calibration curve, and a concentration correction unit that, using a temperature correction formula corresponding to a wavelength region or a wavenumber region in which concentrations of the measurement target components are being determined, corrects concentration changes in the measurement target components that accompany temperature differences between a temperature when the calibration curve is created and a temperature when the concentrations are measured.

Spectrophotometer and spectrophotometry method

The present invention is adapted to make light beams emitted from a light source enter a photodetector both when interposing an optical element having known characteristics and when not interposing the optical element, and acquire a first output value and a second output value that are the output values of the photodetector with respect to each of light beams that respectively have predetermined multiple wavenumbers and are included in the incident light beams, and obtain an arithmetic expression for calculating intensity of incident light beams from an output value of the photodetector, using parameters that are a ratio between the first output value and the second output value at each of the predetermined wavenumbers and the wavenumber transmission or reflection characteristic of the optical element.

Photodetector output correction method used for spectroscopic analyzer

A spectrophotometer is provided, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function &#x3b1; for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function &#x3b2; for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value.

Spectrophotometer and method for calibrating the same

A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

Material gas concentration control system

A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.

Growing community of inventors

Kyoto, Japan

Katsumi Nishimura