Kabushiki Kaisha Toshiba

Katsumi Ichikawa

Makoto Kudou

Hiroshi Tanaka

Shinichi Onodera

Hisashi Chigusa

Hiroaki Wakamatsu

Akiko Fujisawa

Hitoshi Koda

Naoyuki Takazawa

Shinichi Kanbayashi

According to one embodiment, a fuel cell includes a membrane electrode assembly including a plurality of unit cells which are composed of an electrolyte membrane, an anode including anode catalyst layers arranged at intervals on one of surfaces of the electrolyte membrane, and anode gas diffusion layers stacked on the anode catalyst layers, and a cathode including cathode catalyst layers arranged at intervals on the other surface of the electrolyte membrane and opposed to the anode catalyst layers, respectively, and cathode gas diffusion layers stacked on the cathode catalyst layers, wherein a thickness of at least one of the anode catalyst layer and the cathode catalyst layer of one of the unit cells, which neighbor each other, gradually decreases toward the other of the unit cells.

Fuel cell

According to this invention, there is provided an improved method of manufacturing a shadow mask obtained by independently etching both the surfaces of a metal substrate. After one surface is etched to form a first opening, an etching resistive agent composition containing an acrylic resin, casein, and a leveling agent is applied to the obtained opening to form an etching resistive layer. Subsequently, the other surface is etched to form a second opening in the other surface, and then the etching resistive layer is removed to cause the first and second openings to communicate with each other.

Method of manufacturing shadow mask

A method of manufacturing a shadow mask, comprising the steps of forming a first resist pattern having a large number of openings on one major surface of a thin metal plate and a second resist pattern on the other major surface, the second resist pattern having a large number of openings with an opening size larger than that of the first resist pattern, etching the thin metal plate surface having the first resist pattern to form first recesses, removing the first resist pattern, forming an etching-resistive layer on the thin metal plate surface having the first recesses to fill the first recesses, etching the thin metal plate surface having the second resist pattern to form second recesses which have a size larger than that of the first recesses and communicate with the first recesses, treating and swelling the etching-resistive layer with an alkali solution, spraying warm water to the etching-resistive layer to remove the etching-resistive layer, and removing the second resist pattern.

Method of manufacturing shadow mask and apparatus

Growing community of inventors

Kumagaya, Japan

Katsumi Ichikawa