Idemitsu Kosan Company, Limited

Osaka Organic Chemical Industry Ltd.

Katsuki Ito

Hidetoshi Ono

Yasunari Okada

Shinji Tanaka

Hideki Yamane

Akio Kojima

Yoshitaka Uenoyama

Naoya Kawano

A compound represented by the following formula (I), wherein Ris a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group. 

Homoadamantane derivatives, process for preparing same, and photoresist compositions

Adamantane derivatives are provided including a phenolic hydroxyl group-containing adamantane derivative, a glycidyloxy group-containing adamantane derivative, and an adamantyl group-containing epoxy modified acrylate, which exhibit excellent transparency, light resistance, and heat resistance properties. Also provided are resin compositions containing the adamantane derivatives. Further provided are corresponding methods for producing the adamantane derivatives, as well as the resin compositions containing the same.

Adamantane derivative, method for producing the same, and resin composition containing adamantane derivative

Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: 

Adamantane derivative, method for producing the same, resin composition containing the adamantane derivative and use thereof

Growing community of inventors

Chiba, Japan

Katsuki Ito