Hitachi, Ltd.

Hitachi Koki Co., Ltd.

Katsuhito Suzuki

Hiroyoshi Kokaku

Hirosada Morishita

Atsushi Kakuta

Yasuki Mori

Kunihiro Tamahashi

Hideki Asano

Shigeharu Onuma

Akira Hosoya

Kenichi Saida

An electrophotographic photosensitive material having a long lifetime can be provided by forming an amorphous silicon layer having a thickness of 0.01-0.08 .mu.m on the photoconductive layer on the electrically conductive substrate in the said material without changing the characteristics of the photoconductive layer.

Electrophotographic photosensitive material having thin amorphous

The present invention provides polypropylene resin compositions of excellent gloss, impact resistance and rigidity comprising (A) 100 parts by weight of propylene homopolymer having an intrinsic viscosity in tetraline at 135.degree. C. of no less than 1.9, (B) 40-150 parts by weight of ethylene/propylene copolymer having an intrinsic viscosity in tetralin at 135.degree. C. of 1.4-1.7 and an ethylene content of 2-15 molar % and (C) 40-150 parts by weight of ethylene/propylene copolymer having an intrinsic viscosity in tetralin at 135.degree. C. of no less than 1.9 and an ethylene content of 2-20 molar % or comprising above components (A) through (C) and (D) 5-120 parts by weight of a powdery inorganic filler of an average particle diameter of no more than 0.8 .mu.m, and moldings, i.e. molded articles, prepared from these compositions.

Polypropylene resin compositions and moldings thereof

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Mito, Japan

Katsuhito Suzuki