Sumitomo Chemical Company, Limited

Katsuhiro Komuro

Koji Ichikawa

Yuki Takahashi

Tatsuro Masuyama

Shingo Fujita

Jun Oguma

Takashi Nakakoji

Saki Kato

A salt capable of producing a resist pattern with satisfactory CD uniformity (CDU) represented by formula (I), an acid generator and a resist composition including the same: wherein R, R, Rand Reach represent a halogen atom, a haloalkyl group, etc., Aand Aeach represent a hydrocarbon group, the group may have a substituent, —CH— in the group may be replaced by —O—, —CO—, —S—, —SO—, etc., Xand Xeach represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, and AIrepresents an organic anion.

Salt, acid generator, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I) and a resist composition including the same:

Salt, quencher, resist composition and method for producing resist pattern

A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R, Rand Reach represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO—, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and Xrepresents a single bond, —CH—, —O—, —S—, —CO—, —SO— or —SO—.

Carboxylate, quencher, resist composition and method for producing resist pattern

A salt represented by formula (I), an acid generator and a resist composition: wherein R, Rand Reach represent a hydroxy group, —O—R, —O—CO—O—R, —O-L-CO—O—R; R, R, R, R, Rand Reach represent a halogen atom, a hydroxy group, etc.; Lrepresents an alkanediyl group; Rrepresents an acid-labile group; X, Xand Xeach represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; Xrepresents a single bond, —CH—, —O—, —S—, etc.; and AIrepresents an organic anion.

A salt represented by formula (I), a generator and a resist composition: wherein Rand Reach independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R, R, Rand Reach independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, &#x2014;CH&#x2014; included in the haloalkyl group and the alkyl group may be replaced by &#x2014;O&#x2014;, &#x2014;CO&#x2014;, &#x2014;S&#x2014; or &#x2014;SO&#x2014;; Xand Xeach independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1&#x2264;m1+m7&#x2264;5, 0&#x2264;m2+m8&#x2264;5; and AIrepresents an organic anion.

A salt represented by formula (I), an acid generator and a resist composition: wherein R, Rand Reach represent a hydroxy group, &#x2014;O&#x2014;R, &#x2014;O&#x2014;CO&#x2014;O&#x2014;Ror &#x2014;O-L-CO&#x2014;O&#x2014;R, Lrepresents an alkanediyl group, R, R, R, R, Rand Reach represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, Rrepresents an acid-labile group, X, Xand Xeach independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1&#x2264;m1+m7&#x2264;5, 0&#x2264;m2+m8&#x2264;5, 0&#x2264;m3+m9&#x2264;5, and AIrepresents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

Salt and photoresist composition containing the same

Disclosed are a compound represented by formula (I), a resin including a structural unit derived from the compound, and a resist composition: 

Compound, resin, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), and a method for producing the salt, and a quencher and a resist composition comprising the same: 

Salt, quencher, resist composition and method for producing resist pattern, and method for producing salt

A salt represented by formula (I): wherein Rand Reach independently represent a hydroxy group, &#x2014;O&#x2014;R, &#x2014;O&#x2014;CO&#x2014;O&#x2014;Ror &#x2014;O-L-CO&#x2014;O&#x2014;R; Lrepresents an alkanediyl group having 1 to 6 carbon atoms; R, R, Rand Reach independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014;, &#x2014;CO&#x2014;, &#x2014;S&#x2014; or &#x2014;SO&#x2014;; Rrepresents an acid-labile group; Xand Xeach independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AIrepresents an organic anion.

A compound represented by the formula (I): 

Compound, resin, photoresist composition and process for producing photoresist pattern

A salt represented by formula (I), a quencher, and a resist composition including the same: 

A salt is represented by formula (I). In formula (I), R, Rand Reach independently represent a halogen atom, a perfluoroalkyl group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and &#x2014;CH&#x2014; included in the hydrocarbon group may be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of Rmay be the same or different from each other, m2 represents an integer of 0 to 4, and when m2 is 2 or more, a plurality of Rmay be the same or different from each other, and m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of Rmay be the same or different from each other.

A photoresist composition comprising and 

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Osaka, Japan

Katsuhiro Komuro