Kao Corporation

Sharp Kabushiki Kaisha Corporation

Katsuhiko Rindo

Akira Yoshimatsu

Tadashi Nishimori

Takashi Oda

Osamu Takiguchi

Yasushi Kajihara

Ryoichi Hashimoto

Hiroshi Takanashi

Makoto Torizuka

Takashi Kodate

Hirohisa Suzuki

Nobushige Tanaka

Hideyuki Hanazawa

Hiroshi Kawamukai

Kazuo Kubota

Masataka Negishi

Masaaki Moriyama

Kana Fujiwara

A method of producing an organopolysiloxane compound in which a poly(N-acylalkyleneimine) segment comprising repeating units represented by formula (1): wherein Ris a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3,is bonded to a terminal end and/or a side chain of an organopolysiloxane segment, wherein Ris a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, an aralkyl group, or an aryl group, and n is 2 or 3,to ring opening polymerization in a solvent, thereby preparing a terminal reactive poly(N-acylalkyleneimine) solution;

Process for production of organopolysiloxane compound

A detergent composition for cleaning a precision part, comprising an organic solvent, 5 to 30% by weight of a glyceryl ether having an alkyl group or alkenyl group having 4 to 12 carbon atoms, and 5% by weight or more of water. The detergent composition can be used for cleaning a precision part such as a metal part, an electronic part, a semiconductor part or a liquid crystal display panel.

Detergent composition for cleaning precision parts

Emulsified, water-in-oil type composition and skin cosmetic preparation

Polyether polymer, preparation process and use thereof

A liquid crystal display which can provide a homogeneous display by preventing an abnormal orientation of a liquid crystal around the spacers or between the spacers during energization, and which comprises spacer particles each having, at least on the surface thereof, a nonionic hydrophilic unit represented by the following formula (1): ##STR1## wherein R represents a C.sub.1 -C.sub.18 alkyl group, a C.sub.2 -C.sub.18 alkenyl group, a C.sub.6 -C.sub.18 aryl group, a C.sub.7 -C.sub.18 alkylaryl group, a C.sub.1 -C.sub.18 acyl group, a C.sub.2 -C.sub.18 alkylcarbamoyl group, a C.sub.2 -C.sub.18 acylcarbamoyl group or a C.sub.7 -C.sub.18 arylcarbamoyl group; R.sub.1 represents a linear or branched alkylene group having 2 to 4 carbon atoms wherein a hydroxyl group may be substituted for a hydrogen atom on the alkylene group; and m is a positive number of 1 to 100 on the average, with the proviso that the plural R.sub.1 's may be the same or different from each other.

Liquid crystal display

Fine particles of a crosslinked vinyl polymer having a very high compressive modulus of elasticity, i.e., above 550 kg/mm.sup.2 but not higher than 800 kg/mm.sup.2, and being able to be effectively employed as a material capable of maintaining a minute gap constant, and a process for producing the same which comprises polymerizing 100 parts by weight of a vinyl monomer mixture consisting essentially of 20 to 90 parts by weight of m-divinylbenzene, 10 to 60 parts by weight of a vinyl monomer having a nitrile group and 0 to 50 by weight of a vinyl monomer other than m-divinylbenzene and vinyl monomers having a nitrile group in the presence of 3 to 10 parts by weight of a radical polymerization initiator belonging to the organic peroxides, in an aqueous medium.

Fine particles of crosslinked vinyl polymer and process for producing

A liquid crystal display having a structure such that two sheets of substrates each provided with a transparent electrode and an orientation film are disposed opposite to each other through a spacer particle, which has an elastic modulus in compression of 370 to 550 kg/mm.sup.2 at the 10% displacement of the particle diameter, and a liquid crystal layer is also provided. As a result of this structure for the liquid crystal display, a uniform display quality can be realized through a reduction in the cell gap deviation caused when use is made of a thin sheet substrate.

Liquid crystal display with spacer having elastic modulus in compression

Growing community of inventors

Wakayama, Japan

Katsuhiko Rindo