Ulvac, Inc.

Sanyo Electric Co., Ltd.

Katsuhiko Mushiake

Yutaka Kadowaki

Tomoko Saitou

Keng Weng Lim

Akisuke Hirata

Shinji Isoda

Masahiro Iseki

Tsuyoshi Rakuma

Hiroyuki Umezawa

Naoki Hiro

Tomohito Koizumi

Yasuhito Kondo

Yurika Koizumi

Akisuke Ulvac Inc Hirata

Shinji Ulvac Inc Isoda

Yutaka Ulvac Inc Kadowaki

Herein provided are a water-reactive Al-based composite material which is characterized in that it is produced by incorporating, into Al, 2.0 to 3.5% by mass of In, 0.2 to 0.5% by mass of Si and 0.13 to 0.25% by mass of Ti, and which can be dissolved in water through the reaction thereof in a water-containing atmosphere; a water-reactive Al-based thermally sprayed film produced using this composite material; a method for the production of this Al-based thermally sprayed film; and a constituent member for a film-forming chamber which is provided with this Al-based thermally sprayed film on the surface thereof.

Water-reactive Al-based composite material, water-reactive Al-based thermally sprayed film, process for production of such Al-based thermally sprayed film, and constituent member for film-forming chamber

Provided herein are a water-reactive Al composite material which comprises 4NAl or 5NAl, as an Al raw material, containing, on the basis of the amount of the Al raw material, added Bi in an amount ranging from 0.8 to 1.4% by mass and Si, including the Si as an impurity of the Al raw material, in a total amount ranging from 0.25 to 0.7% by mass; a thermally sprayed Al film produced using this Al composite material; a method for the production of this Al film; and a constituent member for a film-forming chamber, which is provided, on the surface, with the thermally sprayed Al film.

Water-reactive Al composite material, water-reactive Al film, process for the production of the Al film, and constituent member for film-forming chamber

Herein disclosed are a water-reactive Al composite material which comprises 4NAI or 5NAI containing added In in an amount ranging from 2 to 5% by mass; and added Si and Si as an impurity in a total amount ranging from 0.04 to 0.6% by mass on the basis of the amount of Al; a thermally sprayed Al film prepared using this material; a method for the production of such an Al film; and a constituent member for a film-forming chamber, which is provided with this thermally sprayed Al film on the surface thereof.

Provided herein are a method for the production of a water-reactive Al film which comprises the steps of melting a material which comprises 4NAl or 5NAl as an Al raw material and added In in an amount ranging from 2 to 5% by mass on the basis of the mass of the Al raw material in such a manner that the composition of the material becomes uniform; thermally spraying the resulting molten material on the surface of a base material according to the electric arc spraying technique, while using Ar gas as a spraying gas; and solidifying the sprayed molten material through quenching to thus form an Al film in which In is uniformly dispersed in Al crystalline grains; and a constituent member for a film-forming chamber, which is provided, on the surface, with this water-reactive Al film.

Method for the production of water-reactive Al film and constituent member for film-forming chamber

There are provided a film forming equipment component having a structure in which an deposited film d formed on the component can be separated from the component for a time period shorter than the prior art to reduce damage due to a cleaning fluid S, and a method of cleaning such a component. A metal film layerelectrochemically less noble than the matrix metal materialof the aforementioned component is formed on the surface of the matrix metal materialthrough thermal spraying, vapor depositing, sputtering, laminating or other process. Alternatively, a second metal film layerelectrochemically more noble than the aforementioned matrix metal materialis formed on the surface of the metal film layerthrough said thermal spraying or other process. Thus, a local cell is formed between the metal film layerand the matrix metal materialor the second metal film layer. Therefore, the deposited film d can be separated from the matrix metal materialfor an extremely shortened time period, without damaging the matrix metal materialitself from the cleaning fluid S.

Components for a film-forming device and method for cleaning the same

In an Al composite material collapsible in the presence of moisture, the external surface of small pieces or powder constructed from a single or a plurality of crystalline grains of Al or an Al alloy is covered with a film of a low melting point metal or alloy selected from the group consisting of In, Sn, combinations of In and Sn, and alloys thereof. The content of the foregoing low melting point metal or alloy ranges from 0.1 to 20% by mass on the basis of the total mass of the composite material. A component member for a film-forming chamber is also provided, which is provided with a water-collapsible Al film on the surface thereof. Film-forming operations are continued over a long period of time using the component member for a film-forming chamber provided with the water-collapsible Al film and then film-forming materials can be recovered from the component member on which the film-forming materials are deposited in a substantial thickness.

Water collapsible aluminum film

Herein disclosed are a component of a film-forming device, in which a thin films is formed on a substrate using a film-forming material, whose surface structure makes any breakage, peeling off and/or falling off of a film adhered to the component quite difficult, while the structure permits easy removal of such an adhered film within a short period of time when cleaning the component as sell as a method for cleaning the component. A large number of through holes each extending from the back face to the top face of the component are formed for the penetration of a cleaning solution into the boundary between the component and a film of the film-forming material adhered to the surface of the component and formed during the formation of the foregoing thin film. This easily allows the peeling off and removal of the film adhered to the component within a short period of time as compared when the adhered film is dissolved only from the surface thereof.

Components for film forming device

There are provided an electrode for electrolysis which takes into consideration safety to human bodies and environmental pollution upon disposal of the electrode, produces ozone with high efficiency and has excellent durability, a production process of the electrode, and an active oxygen producing device using the electrode. In an electrodefor electrolysis which has an electrode catalyst at least on the surface and produces ozone or active oxygen in for-treatment water by electrolysis, the electrode catalyst contains a dielectric which constitutes more than 70% of the surface area of the electrode catalyst.

Electrolyzing electrode and production method therefor and electrolysis method using electrolyzing electrode and electrolysis solution producing device

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Tokyo, Japan

Katsuhiko Mushiake