Dai Nippon Printing Co., Ltd.

Nippon Yusen Kabushiki Kaisha

Monohakobi Technology Institute Co., Ltd.

Katsuhiko Mizuno

Yozo Kosaka

Toshihiko Takeda

Takeshi Nakamura

Nobuaki Kimura

Kounosuke Tanaka

Masaaki Asano

Sakurako Hatori

Satoru Kuramochi

Hiroshi Funada

Shinichi Sakano

Yasunori Kurima

Shoji Takeshige

Yoshiko Fujita

Takashi Miyama

Yasutomo Teshima

Keiko Kosugi

Vittorio Garroni Carbonara

Koichi Asahi

Peter Albrecht

Toshikazu Kakumu

Antti Yrjanainen

Anna-Liisa Syrila

Tuomas Helin

Toni Kuokkanen

This shipis a ship for transporting cargos such as containers, and it is possible to efficiently perform the cargo handling operation for cargos. A lower holdis provided below a deckin a hull. The deckis provided with protruding portionsandprotruding in the right and left side directions of the hull, and a plurality of frameworkseach including vertical pillarsandfixed to the respective protruding portionsandand a horizontal beamthrough which the vertical pillarsandare connected to each other are provided for the deck. Openable partition coversare provided between frameworks adjacent to each other, and an upper holdis formed on the deckby the partition coversand the deck. The cargo handling operation for the lower holdis performed by an inboard craneprovided in the lower hold, and at the same time, the cargo handling operation for the upper holdis performed by a quay crane

Ship

The invention relates to a transfer sheet suitable for the formation of electrode patterns, dielectric layers, barrier layers, etc. in plasma display panels (PDPs), field emission displays (FEDS), liquid crystal displays (LCDS), fluorescent displays, hybrid integrated circuits, etc. The transfer sheet comprises a base film and a transfer layer releasably provided on the base film, optionally with a protective film provided on the transfer layer. The transfer layer comprises an inorganic component including a glass frit and an organic component removable by firing, optionally with an electrically conductive powder. By specifying the surface roughness and surface gloss of the transfer layer, the releasability of the transfer layer with respect to the base or protective film, and the residual solvent content of the transfer layer, it is possible to form, with high accuracy, primer layers, dielectric layers on front or back panel plates, photosensitive black matrix layers, and photosensitive rib layers for use with PDPs, and form high-definition electrode patterns as well.

Transfer sheet

The invention relates to a transfer sheet suitable for the formation of electrode patterns, dielectric layers, barrier layers, etc. in plasma display panels (PDPs), field emission displays (FEDS), liquid crystal displays (LCDs), fluorescent displays, hybrid integrated circuits, etc. The transfer sheet comprises a base film and a transfer layer releasably provided on the base film, optionally with a protective film provided on the transfer layer. The transfer layer comprises an inorganic component including a glass frit and an organic component removable by firing, optionally with an electrically conductive powder. By specifying the surface roughness and surface gloss of the transfer layer, the releasability of the transfer layer with respect to the base or protective film, and the residual solvent content of the transfer layer, it is possible to form, with high accuracy, primer layers, dielectric layers on front or back panel plates, photosensitive black matrix layers, and photosensitive rib layers for use with PDPS, and form high-definition electrode patterns as well.

A plurality of component layers of thick film forming materials are formed simultaneously on a glass substrate by simultaneously applying a plurality of thick film forming pastes to the glass substrates, or by simultaneously transferring the plurality of component layers of thick laminated film formed on a transfer base sheet from the transfer base sheet to the glass substrate. At least one of the plurality of component layers formed on the glass substrate is patterned, and then the plurality of component layers are burned simultaneously to form a patterned thick laminated film on the glass substrate.

Patterned thick laminated film forming method and transfer sheet

There is provided a photosensitive conductor paste comprising at least a polymer, a monomer, a photopolymerization initiator, a conductive powder, a glass frit, and a solvent, the total content of the polymer, the monomer, and the photopolymerization initiator occupying 9 to 30% by weight on a solid basis of the photosensitive conductor paste, the conductive powder occupying 60 to 90% by weight on a solid basis of the photosensitive conductor paste, the glass frit occupying 1 to 10% by weight on a solid basis of the photosensitive conductor paste, the polymer having an alcoholic hydroxyl group and a carboxyl group.

Photosensitive conductor paste

A transfer sheet and a pattern-forming method suitable for forming high-precision patterns for layers such as electrode layers, dielectric layers and barrier layers in the process of producing plasma display panels, image display devices, thermal heads, integrated circuits, etc., and capable of forming patterns having superior surface smoothness, a uniform thickness and high profile precision in a reduced period of time and in high yields. The transfer sheet has an ink layer over a base film. The ink layer consists essentially of an inorganic component containing at least a glass frit, and a thermoplastic resin. The ink layer contains from 3 parts to 50 parts by weight of the thermoplastic resin with respect to 100 parts by weight of the inorganic component. According to the pattern-forming method, a pattern is transferred onto a substrate by using the transfer sheet, and then firing is carried out, thereby forming a high-precision pattern, e.g. an electrode layer, a dielectric layer, a barrier layer, etc.

Transfer sheet, and pattern-forming method

A photoresist film which can form an even fluorescent substance layer, in intimate contact with the surface of cells, in a simplified manner, and a back plate of PDP using the film are provided. More specifically, a photoresist film comprising a base film and, provided on the base film, a photosensitive resin composition layer comprising a fluorescent substance, a photosensitive resin, and a volatile organic material, and a process for producing a back plate of PDP using the film are provided.

Photoresist film and process for producing back plate of plasma display

It is an object of the invention to provide a transfer sheet which is suitable for forming high-precision patterns for electrode layers, dielectric layers, barrier layers, etc. in the process of fabricating plasma display panels, image display devices, thermal heads, integrated circuits, etc., and which enables fabrication times to be reduced with improved yields, and has improved surface smoothness, a uniform thickness and good profile precision, and a pattern-forming method. The transfer sheet of the invention comprises a base film 11 having a concave pattern formed on one side thereof and an ink layer 13 filled in the concave pattern portion 12 in the base film 11, said ink layer being composed of an inorganic component comprising at least a glass frit and a resinous component that is to be removed by firing. Preferably, a second ink layer is stacked on the concave pattern with the ink layer filled therein, and a third ink layer is stacked on the second ink layer. In the pattern-forming method of the invention, the transfer sheet is laminated from an ink layer side thereof on an associated substrate to transfer the concave pattern onto the associated substrate, and the associated substrate having the concave pattern is then fired.

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Tokyo, Japan

Katsuhiko Mizuno